公开(公告)号：US20040178428A1

公开(公告)日：2004-09-16

申请号：US10613200

申请日：2003-07-03

Applicant: Industrial Technology Research Institute

Inventor： Wei-Yang Chou ,  Horng-Long Cheng ,  Chih-Ming Lai ,  Chi-Chang Liao

IPC: H01L029/80

CPC classification number: H01L51/0545 ,  H01L51/0012 ,  H01L51/0034 ,  H01L51/0035 ,  H01L51/0541 ,  Y10T428/10

Abstract: An organic device including a substrate or a dielectric layer; a photoresist layer formed on the substrate or dielectric layer, wherein the photoresist layer is provided with a plurality of microgrooves having an alignment direction; an organic semiconducting layer having alignment formed on the photoresist layer, wherein the organic semiconducting layer aligns according to the alignment direction of the microgrooves of the photoresist layer; and an electrode.

公开(公告)号：US20040105062A1

公开(公告)日：2004-06-03

申请号：US10448669

申请日：2003-05-29

Applicant: Industrial Technology Research Institute

Inventor： Chih-Ming Lai ,  Yang-Yi Fan ,  Chia-Rong Sheu ,  Ching-Yih Chen

IPC: G02F001/1337

CPC classification number: G02F1/133707 ,  G02F1/133753 ,  G02F1/134363 ,  G02F1/1393

Abstract: A wide-viewing angle display device serves as a multi-domain vertical alignment (MVA) mode liquid crystal display (LCD) device or an in-plane switching (IPS) mode liquid crystal display (LCD) device. A plurality of protrusions is formed on the inner surface of the glass substrate, and an electrode array is formed on the tops of the protrusions. Thus, the electrodes are suspended in the liquid crystal cell gap, and a transverse electrical field is generated by the electrodes to drive the liquid crystal molecules.

公开(公告)号：US20040178527A1

公开(公告)日：2004-09-16

申请号：US10637697

申请日：2003-08-11

Applicant: Industrial Technology Research Institute

Inventor： Chi-Chang Liao ,  Chih-Ming Lai ,  Ing-Jer Lin ,  Yi-Chun Wong ,  Lung-Pin Hsin

IPC: B29D011/00

CPC classification number: G02F1/1341 ,  G02F1/133305 ,  G02F1/133377

Abstract: A method for manufacturing the liquid crystal display, which mainly use a auxiliary substrate with polymeric material containing liquid crystal to proceed a photo polymerization process, and then use a first polymeric material layer to proceed a process with plurality electrode, alignment layer and flanges setting in. A second polymeric material mixture coating on a substrate which has plurality electrode pattern an alignment layer and flanges on it. And then align the auxiliary substrate and the substrate to proceed exposure process and combine both due to phase separation, finally removing the assist substrate.

Abstract translation: 一种液晶显示器的制造方法，其主要是使用具有含有液晶的聚合物材料的辅助基板进行光聚合处理，然后使用第一聚合物层进行多个电极，对准层和法兰的处理 在基板上涂覆第二聚合物材料混合物，其上具有多个电极图案，其上具有对准层和凸缘。 然后对准辅助基板和基板进行曝光处理，并由于相分离而组合，最后移除辅助基板。

公开(公告)号：US20040222415A1

公开(公告)日：2004-11-11

申请号：US10864775

申请日：2004-06-09

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Wei-Yang Chou ,  Horng-Long Cheng ,  Chih-Ming Lai ,  Chi-Chang Liao

IPC: H01L035/24

CPC classification number: H01L51/0545 ,  H01L51/0012 ,  H01L51/0034 ,  H01L51/0035 ,  H01L51/0541 ,  Y10T428/10

Abstract: An organic device including a substrate or a dielectric layer; a photoresist layer formed on the substrate or dielectric layer, wherein the photoresist layer is provided with a plurality of microgrooves having an alignment direction; an organic semiconducting layer having alignment formed on the photoresist layer, wherein the organic semiconducting layer aligns according to the alignment direction of the microgrooves of the photoresist layer; and an electrode.

Abstract translation: 一种包括基底或电介质层的有机器件; 形成在所述基板或电介质层上的光致抗蚀剂层，其中所述光致抗蚀剂层设置有具有对准方向的多个微槽; 在所述光致抗蚀剂层上形成对准的有机半导体层，其中所述有机半导体层根据所述光致抗蚀剂层的微槽的排列方向排列; 和电极。

公开(公告)号：US20040046923A1

公开(公告)日：2004-03-11

申请号：US10434202

申请日：2003-05-09

Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

Inventor： Po-Ling Shiao ,  Chi-Chang Liao ,  Chih-Ming Lai ,  Yih-Jun Wong ,  Hsien-Teng Chang ,  Wen-Bing Liu ,  Chien-Tsung Wu ,  Hsi-Hsin Shih

IPC: G02F001/1333

CPC classification number: G02F1/133553 ,  G02F1/133305

Abstract: A plastic liquid crystal display device and a fabrication method thereof. A plastic substrate having a plurality of bumps on at least one surface thereof is integrally molded. A glass transition temperature (Tg) of the plastic substrate is greater than 150null C. A melt flow index (MFI) of the plastic substrate is greater than 2. A conformal reflective film on the plastic substrate with the bumps is formed. An insulating substrate opposite the plastic plate is provided. A transparent electrode is formed on an inner surface of the insulating substrate. A liquid crystal layer is inserted between the plastic substrate and the insulating substrate.

Abstract translation: 一种塑料液晶显示装置及其制造方法。 在其至少一个表面上具有多个凸块的塑料基板被一体地模制。 塑料基板的玻璃化转变温度（Tg）大于150℃。塑料基板的熔体流动指数（MFI）大于2.形成具有凸块的塑料基板上的共形反射膜。 提供与塑料板相对的绝缘基板。 在绝缘基板的内表面上形成透明电极。 在塑料基板和绝缘基板之间插入液晶层。

公开(公告)号：US20030223027A1

公开(公告)日：2003-12-04

申请号：US10413259

申请日：2003-04-14

Applicant: Industrial Technology Research Institute

Inventor： Ching-Yih Chen ,  Chih-Ming Lai

IPC: G02F001/1337

CPC classification number: G02F1/13394 ,  G02F1/133707 ,  G02F1/133753 ,  G02F1/1393

Abstract: A method of simultaneously fabricating a photospacer and a bump applicable on a substrate with a photoresist layer formed thereon. A photomask is provided with a first mask pattern and a second mask pattern thereon, wherein the first mask pattern for the formation of the bump includes a plurality of light-shielding units constituting a first shape, and the second mask pattern for the formation of the photospacer is composed of a light-shielding pattern with a second shape. The photomask is then applied on the photoresist layer to perform photolithography, thereby fabricating the photospacer and the bump simultaneously. According to the method, only one photolithography step is required to fabricate the photospacer and bump of different thickness, such that yield is increased and cost is lowered.

Abstract translation: 同时制造适用于其上形成有光致抗蚀剂层的基板上的光电隔离器和凸块的方法。 光掩模在其上设置有第一掩模图案和第二掩模图案，其中用于形成凸块的第一掩模图案包括构成第一形状的多个遮光单元，以及用于形成第二掩模图案的第二掩模图案 光隔片由具有第二形状的遮光图案组成。 然后将光掩模施加在光致抗蚀剂层上以进行光刻，从而同时制造光刻胶和凸块。 根据该方法，仅需要一个光刻步骤来制造不同厚度的光学掩模和凸块，从而增加产量并降低成本。