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1.发明申请Organic device including semiconducting layer aligned according to microgrooves of photoresist layer 失效有机器件包括根据光致抗蚀剂层的微槽对准的半导体层公开(公告)号：US20040222415A1
公开(公告)日：2004-11-11
申请号：US10864775
申请日：2004-06-09
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor： Wei-Yang Chou , Horng-Long Cheng , Chih-Ming Lai , Chi-Chang Liao
IPC: H01L035/24
CPC classification number: H01L51/0545 , H01L51/0012 , H01L51/0034 , H01L51/0035 , H01L51/0541 , Y10T428/10
Abstract: An organic device including a substrate or a dielectric layer; a photoresist layer formed on the substrate or dielectric layer, wherein the photoresist layer is provided with a plurality of microgrooves having an alignment direction; an organic semiconducting layer having alignment formed on the photoresist layer, wherein the organic semiconducting layer aligns according to the alignment direction of the microgrooves of the photoresist layer; and an electrode.
Abstract translation: 一种包括基底或电介质层的有机器件; 形成在所述基板或电介质层上的光致抗蚀剂层，其中所述光致抗蚀剂层设置有具有对准方向的多个微槽; 在所述光致抗蚀剂层上形成对准的有机半导体层，其中所述有机半导体层根据所述光致抗蚀剂层的微槽的排列方向排列; 和电极。
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2.发明申请公开(公告)号：US20040178428A1
公开(公告)日：2004-09-16
申请号：US10613200
申请日：2003-07-03
Applicant: Industrial Technology Research Institute
Inventor： Wei-Yang Chou , Horng-Long Cheng , Chih-Ming Lai , Chi-Chang Liao
IPC: H01L029/80
CPC classification number: H01L51/0545 , H01L51/0012 , H01L51/0034 , H01L51/0035 , H01L51/0541 , Y10T428/10
Abstract: An organic device including a substrate or a dielectric layer; a photoresist layer formed on the substrate or dielectric layer, wherein the photoresist layer is provided with a plurality of microgrooves having an alignment direction; an organic semiconducting layer having alignment formed on the photoresist layer, wherein the organic semiconducting layer aligns according to the alignment direction of the microgrooves of the photoresist layer; and an electrode.
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