发明申请
US20050087139A1 Antenna for use in producing plasma and plasma processing apparatus comprising the same
审中-公开
用于制造等离子体和等离子体处理装置的天线
- 专利标题: Antenna for use in producing plasma and plasma processing apparatus comprising the same
- 专利标题(中): 用于制造等离子体和等离子体处理装置的天线
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申请号: US10969928申请日: 2004-10-22
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公开(公告)号: US20050087139A1公开(公告)日: 2005-04-28
- 发明人: Woo-Seok Kim , Seung-Ki Chae , Do-Young Kam , Kwang-Myung Lee , Jai-Hyung Won , Jai-Kwang Shin , Jae-Joon Oh , Sang-Jean Jeon
- 申请人: Woo-Seok Kim , Seung-Ki Chae , Do-Young Kam , Kwang-Myung Lee , Jai-Hyung Won , Jai-Kwang Shin , Jae-Joon Oh , Sang-Jean Jeon
- 优先权: KR2003-75435 20031028
- 主分类号: H04B1/40
- IPC分类号: H04B1/40 ; C23C16/00 ; H01J37/32
摘要:
An antenna includes branches having substantially identical shapes. The branches are symmetrically disposed about a central point and extend along at least two concentric patterns whose geometric centers coincide with the central point. The branches each include pattern-forming portions that lie entirely within the concentric patterns, and at least one connecting portion extending between and connecting the pattern-forming portions. Input/output terminals for allowing a voltage to be impressed across the branches are provided at ends of each of the branches.
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