发明申请
- 专利标题： Apparatus for fabricating coating and method of fabricating the coating
- 专利标题（中）： 用于制造涂层的装置和制造涂层的方法
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申请号： US10978461申请日： 2004-11-02
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公开(公告)号： US20050089648A1公开(公告)日： 2005-04-28
- 发明人: Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
- 申请人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
- 申请人地址： JP Atsugi-shi
- 专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址： JP Atsugi-shi
- 优先权： JP5-200251 19930720; JP5-201833 19930722; JP6-119632 19930509
- 主分类号： C23C16/26
- IPC分类号： C23C16/26 ; C23C16/509 ; G11B5/72 ; G11B5/74 ; G11B5/78 ; G11B5/82 ; G11B5/84 ; G11B7/24 ; G11B11/105 ; H05H1/24
摘要：
In an apparatus for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequency power supply and a grounded electrode to fabricate a carbon coating on the surface of the object. Also, an electrode interval is set to 6 mm or less, pressure between the electrodes is set to 15 Torr to 100 Torr, whereby high-density plasma is generated to form an ion sheath on an anode side. Therefore, a coating is fabricated on the surface of the object by bombardment of ions.
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