发明申请
- 专利标题: Method for manufacturing thin-film magnetic head sliders
- 专利标题(中): 制造薄膜磁头滑块的方法
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申请号: US10917591申请日: 2004-08-13
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公开(公告)号: US20050091836A1公开(公告)日: 2005-05-05
- 发明人: Cherngye Hwang , Kim Lee , Gary McClelland , Dennis McKean , Timothy Reiley
- 申请人: Cherngye Hwang , Kim Lee , Gary McClelland , Dennis McKean , Timothy Reiley
- 申请人地址: NL Amsterdam
- 专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人: Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人地址: NL Amsterdam
- 主分类号: B29C41/04
- IPC分类号: B29C41/04 ; B29C71/02 ; G11B5/10 ; G11B5/105 ; G11B5/127 ; G11B5/31 ; G11B5/60
摘要:
A method for manufacturing thin-film magnetic head sliders is disclosed. Initially, an elastic layer, which may be made of poly-dimethyl siloxane (PDMS), is spun on a wafer and is thermally cured. Then, a resist layer is spun on the elastic layer. Both the resist layer and the elastic layer are subsequently peeled off together from the wafer. Next, the peeled resist layer/elastic layer is applied onto a group of magnetic heads with the resist layer in direct contact with the magnetic heads. Finally, the elastic layer is peeled off from the resist layer such that the resist layer remains attaching to the magnetic heads.
公开/授权文献
- US07191508B2 Method for manufacturing thin-film magnetic head sliders 公开/授权日:2007-03-20
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