发明申请
- 专利标题: Optical critical dimension measurement equipment
- 专利标题(中): 光学关键尺寸测量设备
-
申请号: US10919367申请日: 2004-08-17
-
公开(公告)号: US20050140988A1公开(公告)日: 2005-06-30
- 发明人: Dong-gun Lee , Seong-woon Choi , Seong-yong Moon , Byung-gook Kim , Min-ah Kim
- 申请人: Dong-gun Lee , Seong-woon Choi , Seong-yong Moon , Byung-gook Kim , Min-ah Kim
- 优先权: KR2003-99051 20031229
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; G01B11/02 ; G01B11/14 ; G03F7/20
摘要:
An OCD measurement equipment, including a tunable laser system, and a method of measuring the CD of patterns formed on a substrate. A light source optical system emits light which wavelength changes over time. A projector optical system projects the light emitted from the light source optical system on the substrate. A substrate support unit supports the substrate. An image relay optical system relays light reflected by the substrate. An image detection optical system detects the light relayed by the image relay optical system using a detector which detects the spatial distribution of the light.
信息查询
IPC分类: