Invention Application
- Patent Title: Optical critical dimension measurement equipment
- Patent Title (中): 光学关键尺寸测量设备
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Application No.: US10919367Application Date: 2004-08-17
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Publication No.: US20050140988A1Publication Date: 2005-06-30
- Inventor: Dong-gun Lee , Seong-woon Choi , Seong-yong Moon , Byung-gook Kim , Min-ah Kim
- Applicant: Dong-gun Lee , Seong-woon Choi , Seong-yong Moon , Byung-gook Kim , Min-ah Kim
- Priority: KR2003-99051 20031229
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01B11/02 ; G01B11/14 ; G03F7/20

Abstract:
An OCD measurement equipment, including a tunable laser system, and a method of measuring the CD of patterns formed on a substrate. A light source optical system emits light which wavelength changes over time. A projector optical system projects the light emitted from the light source optical system on the substrate. A substrate support unit supports the substrate. An image relay optical system relays light reflected by the substrate. An image detection optical system detects the light relayed by the image relay optical system using a detector which detects the spatial distribution of the light.
Information query
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