发明申请
US20050158469A1 Reactor for thin film deposition and method for depositing thin film on wafer using the reactor
审中-公开
用于薄膜沉积的反应器和使用反应器在晶片上沉积薄膜的方法
- 专利标题: Reactor for thin film deposition and method for depositing thin film on wafer using the reactor
- 专利标题(中): 用于薄膜沉积的反应器和使用反应器在晶片上沉积薄膜的方法
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申请号: US11080748申请日: 2005-03-15
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公开(公告)号: US20050158469A1公开(公告)日: 2005-07-21
- 发明人: Young Park , Keun Yoo , Hong Lim , Sang Lee , Ik Lee , Sang Lee , Hyun Kyung , Jang Bae
- 申请人: Young Park , Keun Yoo , Hong Lim , Sang Lee , Ik Lee , Sang Lee , Hyun Kyung , Jang Bae
- 优先权: KR2001-43496 20010719
- 主分类号: H01L21/20
- IPC分类号: H01L21/20 ; C23C16/44 ; C23C16/455 ; C23C16/509 ; C23C16/00
摘要:
A reactor for thin film deposition and a thin film deposition method using the reactor are provided. The reactor includes: a reactor block which receives a wafer transferred through a wafer transfer slit; a wafer block which is installed in the reactor block to receive the wafer thereon; a top plate disposed to cover the reactor block; a shower head which is mounted on the bottom of the top plate and diffuses gas toward the wafer; and an exhaust unit which exhausts the gas from the reactor block. A first supply pipeline which supplies a first reactant gas and/or an inert gas to the wafer; a second supply pipeline which supplies a second reactant gas and/or an inert gas to the wafer; and a plasma generator which generates plasma between the wafer block and shower head are included. The shower head includes: a first supply path connected to the first supply pipeline; a plurality of first diffuse holes formed in the bottom of the shower head at a constant interval; a first main path formed parallel to the plane of the shower head and connecting the plurality of first diffuse holes and the first supply path; a second supply path connected to the second supply pipeline; a plurality of second diffuse holes formed in the bottom of the shower head at a constant interval as the plurality of the first diffuse holes; and a second main path formed parallel to the plane of the shower head at a different height from the second main path and connecting the plurality of second diffuse holes and the second supply path.