公开(公告)号：US20050158469A1

公开(公告)日：2005-07-21

申请号：US11080748

申请日：2005-03-15

申请人： Young Park ,  Keun Yoo ,  Hong Lim ,  Sang Lee ,  Ik Lee ,  Sang Lee ,  Hyun Kyung ,  Jang Bae

发明人： Young Park ,  Keun Yoo ,  Hong Lim ,  Sang Lee ,  Ik Lee ,  Sang Lee ,  Hyun Kyung ,  Jang Bae

IPC分类号： H01L21/20 ,  C23C16/44 ,  C23C16/455 ,  C23C16/509 ,  C23C16/00

CPC分类号： C23C16/45574 ,  C23C16/45527 ,  C23C16/45536 ,  C23C16/45538 ,  C23C16/45544 ,  C23C16/45565 ,  C23C16/5096

摘要： A reactor for thin film deposition and a thin film deposition method using the reactor are provided. The reactor includes: a reactor block which receives a wafer transferred through a wafer transfer slit; a wafer block which is installed in the reactor block to receive the wafer thereon; a top plate disposed to cover the reactor block; a shower head which is mounted on the bottom of the top plate and diffuses gas toward the wafer; and an exhaust unit which exhausts the gas from the reactor block. A first supply pipeline which supplies a first reactant gas and/or an inert gas to the wafer; a second supply pipeline which supplies a second reactant gas and/or an inert gas to the wafer; and a plasma generator which generates plasma between the wafer block and shower head are included. The shower head includes: a first supply path connected to the first supply pipeline; a plurality of first diffuse holes formed in the bottom of the shower head at a constant interval; a first main path formed parallel to the plane of the shower head and connecting the plurality of first diffuse holes and the first supply path; a second supply path connected to the second supply pipeline; a plurality of second diffuse holes formed in the bottom of the shower head at a constant interval as the plurality of the first diffuse holes; and a second main path formed parallel to the plane of the shower head at a different height from the second main path and connecting the plurality of second diffuse holes and the second supply path.

摘要翻译： 提供了一种用于薄膜沉积的反应器和使用该反应器的薄膜沉积方法。 反应器包括：反应器块，其接收通过晶片传送狭缝转移的晶片; 晶片块，其安装在反应器块中以在其上接收晶片; 设置成覆盖反应器块的顶板; 淋浴头，其安装在顶板的底部并将气体向晶片扩散; 以及从反应器块排出气体的排气单元。 一种向晶片提供第一反应气体和/或惰性气体的第一供应管线; 第二供应管线，其向所述晶片供给第二反应气体和/或惰性气体; 并且包括在晶片块和淋浴头之间产生等离子体的等离子体发生器。 淋浴头包括：连接到第一供应管道的第一供应路径; 以恒定的间隔形成在所述淋浴喷头的底部的多个第一扩散孔; 第一主路径，其平行于所述淋浴头的平面形成，并且连接所述多个第一扩散孔和所述第一供给路径; 连接到第二供应管线的第二供应路径; 多个第二扩散孔，作为多个第一扩散孔以恒定的间隔形成在所述淋浴喷头的底部; 以及第二主路径，其与所述淋浴喷头的平面平行，与所述第二主路径不同的高度，并且连接所述多个第二扩散孔和所述第二供应路径。

公开(公告)号：US20060201428A1

公开(公告)日：2006-09-14

申请号：US11436473

申请日：2006-05-18

申请人： Young Park ,  Keun Yoo ,  Hong Lim ,  Sang Lee ,  Ik Lee ,  Sang Lee ,  Hyun Kyung ,  Jang Bae

发明人： Young Park ,  Keun Yoo ,  Hong Lim ,  Sang Lee ,  Ik Lee ,  Sang Lee ,  Hyun Kyung ,  Jang Bae

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： C23C16/45574 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/45565 ,  C23C16/5096

摘要： Provided is a shower head used in a reactor for thin film deposition, and a method of fabricating the shower head. The shower head for injecting gases onto a wafer mounted on a wafer block includes: a first supply path supplying a first reaction gas and a second supply path supplying a second reaction gas; a first main path connected to the first supply path and in the plane of the shower head, a plurality of first sub-paths diverging from the first main path in the plane of the shower head, a plurality of first diffuse holes formed regularly spaced on a bottom surface of the shower head, and a plurality of first diffuse paths connecting the plurality of first sub-paths to the plurality of first diffuse holes; a second main path connected to the second supply path in the plane of the shower head and not contacting the first main path, a plurality of second sub-paths diverging from the second main path in the plane of the shower head, a plurality of second diffuse holes formed regularly spaced on a bottom surface of the shower head, and a plurality of second diffuse paths connecting the plurality of second sub-paths and the plurality of second diffuse holes; and a sealing unit sealing open ends of the first and second main paths and open ends of the first and second sub-paths formed in the shower head.

摘要翻译： 本发明提供一种用于薄膜沉积用反应器的淋浴喷头及其制造方法。 用于将气体喷射到安装在晶片块上的晶片上的喷头包括：供应第一反应气体的第一供应路径和供应第二反应气体的第二供应路径; 连接到第一供应路径并且在淋浴喷头的平面中的第一主路径，从喷淋头的平面中的第一主路径发散的多个第一子路径，多个第一扩散孔，其规则间隔开地形成 淋浴头的底面以及将多个第一子路径连接到多个第一扩散孔的多个第一漫射路径; 第二主路径，其连接到所述淋浴喷头的平面中的所述第二供应路径，并且不接触所述第一主路径;多个第二子路径，其从所述淋浴喷头的平面中的所述第二主路径发散;多个第二主路径， 在喷淋头的底面上规则间隔地形成的扩散孔以及连接多个第二子路径和多个第二扩散孔的多个第二漫射路径; 以及密封单元，密封形成在所述淋浴喷头中的所述第一和第二子路径的所述第一主路径和所述第二主路径的开放端部。

公开(公告)号：US20050003088A1

公开(公告)日：2005-01-06

申请号：US10882532

申请日：2004-06-30

申请人： Young Park ,  Byung Cho ,  Hong Lim ,  Sang Lee ,  Sahng Lee ,  Tae Seo ,  Ho Chang

发明人： Young Park ,  Byung Cho ,  Hong Lim ,  Sang Lee ,  Sahng Lee ,  Tae Seo ,  Ho Chang

IPC分类号： H01L21/205 ,  C23C16/00 ,  C23C16/44 ,  H01L21/3065 ,  H01L21/31

CPC分类号： H01J37/32862 ,  C23C16/4405

摘要： Provided is a method of depositing a thin film on a wafer. The method includes an operation of loading a wafer on a wafer block; an operation of depositing a thin film on the wafer after loading the wafer; an operation of unloading the wafer on which the thin film is deposited from the wafer block; an operation of dry cleaning to remove thin films accumulated on an inner surface of the chamber after unloading the wafer; and an operation of chamber seasoning to form an atmosphere for depositing the main thin film after dry cleaning, wherein the dry cleaning operation comprises: an operation of loading a dummy wafer on the wafer block after unloading the wafer; an operation of main dry cleaning to remove the thin films accumulated on the inner surface of the chamber by dry cleaning by supplying an inert gas and a cleaning gas and supplying a RF energy to the chamber; an operation of sub-dry cleaning to remove an element of the cleaning gas used in the operation of main dry cleaning and remaining on the surface of the chamber by activating a gas selected from the group consisting of H2, NH3, Ar, and N2 by applying RF energy into the chamber while discontinuing supplying of the cleaning gas into the chamber; and an operation of unloading the dummy wafer from the wafer block after the sub-dry cleaning operation.

摘要翻译： 提供了一种在晶片上沉积薄膜的方法。 该方法包括将晶片装载在晶片块上的操作; 在加载晶片之后在晶片上沉积薄膜的操作; 从晶片块卸载其上沉积有薄膜的晶片的操作; 干燥清洗操作，以在卸载晶片之后去除积聚在室内表面上的薄膜; 以及室内调节的操作，以形成用于在干洗后沉积主薄膜的气氛，其中所述干洗操作包括：在卸载晶片之后将晶片块上的虚设晶片加载的操作; 主干燥操作，通过供给惰性气体和清洁气体并向室提供RF能量通过干洗来除去积聚在室内表面上的薄膜; 通过将通过活化从由H 2，NH 3，Ar和N 2组成的组中选出的气体来除去主要干洗操作中使用的清洁气体的元素并残留在室的表面上的次干洗操作， 在停止将清洁气体供应到所述室中的同时将RF能量施加到所述室中; 以及在次干洗操作之后从晶片块卸载虚设晶片的操作。

公开(公告)号：US20060093922A1

公开(公告)日：2006-05-04

申请号：US11234841

申请日：2005-09-22

申请人： Cheon Kim ,  Hong Lim ,  Sang Lee

发明人： Cheon Kim ,  Hong Lim ,  Sang Lee

IPC分类号： H01M2/16 ,  H01M4/66 ,  H01M6/10

CPC分类号： H01M2/08 ,  C08K3/20 ,  C08K3/28 ,  C09J7/22 ,  C09J2205/106 ,  C09J2423/006 ,  C09J2467/006 ,  C09J2471/006 ,  C09J2479/086 ,  C09J2481/006 ,  H01M2/0275 ,  H01M2/1022 ,  H01M2/32 ,  H01M2/34 ,  H01M10/052 ,  H01M10/0587 ,  H01M10/425 ,  H01M2200/00

摘要： A composite material tape and a lithium secondary battery using the same are provided. The composite material tape includes an organic base and at least one inorganic element dispersed within the organic base. The composite material tapes of the present invention exhibit improved insulative and heat-resistant characteristics.

摘要翻译： 提供复合材料带和使用其的锂二次电池。 复合材料带包括有机基底和分散在有机基底内的至少一种无机元素。 本发明的复合材料带表现出改善的绝缘和耐热特性。

公开(公告)号：US20050202643A1

公开(公告)日：2005-09-15

申请号：US10876477

申请日：2004-06-28

申请人： Sang Lee ,  Yil Kim ,  Jin Ahn ,  Young Park

发明人： Sang Lee ,  Yil Kim ,  Jin Ahn ,  Young Park

IPC分类号： H01L21/8247 ,  H01L21/3205 ,  H01L21/336 ,  H01L21/8234 ,  H01L27/115 ,  H01L29/788 ,  H01L29/792

CPC分类号： H01L21/28282 ,  H01L27/11568 ,  H01L29/66833 ,  H01L29/7923

摘要： A transistor and a method for manufacturing the same are disclosed. One cell transistor having SIS (silicon-insulator-silicon) structure and two cell transistors having SONOS (silicon-oxide-nitride-oxide-silicon) structure constitute the transistor of the present invention which can store 2 bits. The cell transistor having SIS structure and the cell transistors having SONOS (silicon-oxide-nitride-oxide-silicon) structure share one common gate electrode so that the transistor of the present invention requires only one voltage generation and control circuit.

摘要翻译： 公开了晶体管及其制造方法。 具有SIS（硅 - 绝缘体 - 硅）结构的一个单元晶体管和具有SONOS（氧化硅 - 氧化物 - 氧化物 - 硅）结构的两个单元晶体管构成了可以存储2位的本发明的晶体管。 具有SIS结构的单元晶体管和具有SONOS（氧化硅 - 氮化物 - 氧化物 - 硅））结构的单元晶体管共享一个公共栅电极，使得本发明的晶体管仅需要一个电压产生和控制电路。

公开(公告)号：US20050144204A1

公开(公告)日：2005-06-30

申请号：US10917685

申请日：2004-08-12

申请人： Yun Lee ,  Sung Jun ,  Young Park ,  Sang Lee ,  Young Kim ,  Kyo II Chung

发明人： Yun Lee ,  Sung Jun ,  Young Park ,  Sang Lee ,  Young Kim ,  Kyo II Chung

IPC分类号： G06F7/06 ,  G06F7/00 ,  H04L9/32

CPC分类号： H04L9/0643

摘要： An apparatus and method for computing a SHA-1 hash function value are provided. The apparatus includes a first register unit including a plurality of registers that store a first bit string of predetermined lengths for generation of a hash function value; a second register unit storing input data in units of second bit strings with predetermined lengths, and sequentially outputting the second bit strings; a third register unit performing an operation on the first bit string of the plurality of registers and the second bit strings output from the second register unit so as to generate and store a third bit string, and updating first-bit string of the plurality of registers based on the third bit string; and an adding unit combining the first bit string stored in the first register unit, the first bit string of the third bit string stored in the third register unit, and the original initial values stored in the first register unit so as to obtain a hash function value. Accordingly, it is possible to reduce the size of the apparatus and stably compute a hash function value at a high speed.

摘要翻译： 提供了一种用于计算SHA-1散列函数值的装置和方法。 该装置包括：第一寄存器单元，包括多个寄存器，用于存储用于生成散列函数值的预定长度的第一位串; 第二寄存器单元，以预定长度的第二位串为单位存储输入数据，并顺序地输出第二位串; 第三寄存器单元，对所述多个寄存器中的第一位串执行操作，以及从所述第二寄存器单元输出的所述第二位串，以产生和存储第三位串，并且更新所述多个寄存器中的第一位串 基于第三位串; 以及添加单元，组合存储在第一寄存器单元中的第一位串，存储在第三寄存器单元中的第三位串的第一位串和存储在第一寄存器单元中的原始初始值，以获得散列函数 值。 因此，可以减小装置的尺寸并且可以高速稳定地计算散列函数值。

公开(公告)号：US20070046856A1

公开(公告)日：2007-03-01

申请号：US11552289

申请日：2006-10-24

申请人： Sang Lee ,  Jung Kang ,  Sang Lee

发明人： Sang Lee ,  Jung Kang ,  Sang Lee

IPC分类号： G02F1/1335

CPC分类号： G02B6/0038 ,  G02B6/0053 ,  G02F2001/133607

摘要： An LCD device has scratch-resistant property without using a protection sheet and can provide enhanced brightness. The LCD device includes a light path regulating member. The member includes a first prism sheet having first prisms of which apex has a round shape. The first prism sheet concentrates light supplied from a lamp to output the concentrated light. An anti-glare polarizing plate uniformly polarizes polarized planes of the concentrated light and provides the polarized light to the lower substrate. The anti-glare polarizing plate is arranged below the lower substrate of an LCD panel, and an uppermost prism sheet of optical sheets is non-matte-treated and has round-treated apexes. In spite of the absence of the protection sheet, the scratch-resistant property of the uppermost prism sheet and the brightness of the LCD panel may be enhanced.

摘要翻译： 液晶显示装置具有耐刮擦性能，不使用保护片，可提供更高的亮度。 LCD装置包括光路调节部件。 该构件包括具有顶点具有圆形形状的第一棱镜的第一棱镜片。 第一棱镜片集中从灯提供的光以输出集中的光。 抗眩光偏光板使聚光的偏振面均匀地偏振，并向下基板提供偏振光。 防眩光偏振板配置在LCD面板的下基板的下方，最上方的光学片棱镜片未经磨光处理，具有圆形处理的顶点。 尽管不存在保护片，但是可以提高最上面的棱镜片的耐擦伤性和LCD面板的亮度。

公开(公告)号：US20070054387A1

公开(公告)日：2007-03-08

申请号：US10580556

申请日：2004-05-20

申请人： Sang Lee ,  Sang Lee

发明人： Sang Lee ,  Sang Lee

IPC分类号： C12P7/46 ,  C12N1/20

CPC分类号： C12P7/46 ,  C12N1/20 ,  C12R1/01

摘要： The present invention relates to novel rumen bacterial mutants resulted from the disruption of a lactate dehydrogenase gene (ldhA) and a pyruvate formate-lyase gene (pfl) (which are involved in the production of lactic acid, formic acid and acetic acid) from rumen bacteria; a novel bacterial mutant (Mannheimia sp. LPK7) having disruptions of a lactate dehydrogenase gene (ldhA), a pyruvate formate-lyase gene (pfl), a phosphotransacetylase gene (pta), and a acetate kinase gene (ackA); a novel bacterial mutant (Mannheimia sp. LPK4) having disruptions of a lactate dehydrogenase gene (ldhA), a pyruvate formate-lyase gene (pfl) and a phosphoenolpyruvate carboxylase gene (ppc) involved in the immobilization of CO2 in a metabolic pathway of producing succinic acid; and a method for producing succinic acid, which is characterized by the culture of the above mutants in anaerobic conditions. The inventive bacterial mutants have the property of producing succinic acid at high concentration while producing little or no organic acids, as compared to the prior wild-type strains of producing various organic acids. Thus, the inventive bacterial mutants are useful as strains for the industrial production of succinic acid.

摘要翻译： 本发明涉及由瘤胃中的乳酸脱氢酶基因（ldhA）和丙酮酸甲酸裂解酶基因（pfl）（其涉及乳酸，甲酸和乙酸的生产）的破坏而产生的新型瘤胃细菌突变体 菌; 具有乳酸脱氢酶基因（ldhA），丙酮酸甲酸裂解酶基因（pfl），磷酸转乙酰酶基因（pta）和乙酸激酶基因（ackA）的破坏的新型细菌突变体（曼氏血清型LPK7）; 具有破坏乳酸脱氢酶基因（ldhA），丙酮酸甲酸裂合酶基因（pfl）和磷酸烯醇丙酮酸羧化酶基因（ppc）的新型细菌突变体（曼氏原乳杆菌LPK4）涉及将CO 2固定在生产代谢途径中 琥珀酸; 以及生产琥珀酸的方法，其特征在于在厌氧条件下培养上述突变体。 与生产各种有机酸的现有野生型菌株相比，本发明的细菌突变体具有以高浓度生产琥珀酸的同时产生很少或不含有机酸的性质。 因此，本发明的细菌突变体可用作工业生产琥珀酸的菌株。

公开(公告)号：US20070081355A1

公开(公告)日：2007-04-12

申请号：US11502025

申请日：2006-08-10

申请人： Sang Lee ,  Eun Kang ,  Sang Lee

发明人： Sang Lee ,  Eun Kang ,  Sang Lee

IPC分类号： B64D47/06 ,  F21V5/00

CPC分类号： G02B6/0068 ,  G02B6/0055 ,  G02B6/0085 ,  G02B6/009 ,  G02F1/133615

摘要： A light generating unit includes a plurality of light sources generating lights with different wavelengths. Among the light sources, at least one is disposed on a horizontal surface which differs in height from horizontal surfaces on which the other light sources are disposed. A display device includes the above light generating unit and a display panel for displaying an image by using the lights generated from the light generating unit. A method of improving color uniformity in the display device includes arranging the light sources as in the light generating unit.

摘要翻译： 光产生单元包括产生具有不同波长的光的多个光源。 在光源中，至少一个设置在与设置其他光源的水平表面不同的水平表面上。 显示装置包括上述光产生单元和用于通过使用从发光单元产生的光来显示图像的显示面板。 改善显示装置中的色彩均匀性的方法包括如光发生单元那样布置光源。

公开(公告)号：US20050249560A1

公开(公告)日：2005-11-10

申请号：US11118165

申请日：2005-04-28

申请人： Hwan Lee ,  Seo Pyun ,  Sang Lee ,  Byung Jin ,  Sang Lee ,  Tae Um ,  Yong Shim ,  Shin Kim

发明人： Hwan Lee ,  Seo Pyun ,  Sang Lee ,  Byung Jin ,  Sang Lee ,  Tae Um ,  Yong Shim ,  Shin Kim

IPC分类号： B23D61/00 ,  B23D61/04 ,  B28D1/12

CPC分类号： B23D61/04 ,  B28D1/121 ,  Y10T407/26

摘要： Disclosed is a diamond tool having a metal plate inserted therein. Between abrasive layers containing diamond particles is inserted a ferrous or non-ferrous metal plate having a wear resistance lower than that of the abrasive layers such that a concave groove is spontaneously formed during a cutting process, thereby reducing the contact load with a workpiece to thereby avoid vibration (wobbling) of a shank, and providing a discharge path for smoothly removing cutting chips and the cooling water. In addition, the content of abrasives and the wear resistance of bonding material are uniformly constituted so that the shrinkage rate does not need to be considered during sintering and the manufacturing process can be simplified, thereby reducing the manufacturing cost and improving the productivity therefor. Furthermore, the area of the metal plate can be controlled, thereby enabling an easy design conforming to the working conditions with a workpiece.

摘要翻译： 公开了一种金刚石工具，其中插入有金属板。 在含有金刚石颗粒的研磨层之间插入耐磨性低于研磨层的耐磨性的铁或非铁金属板，使得在切割过程中自发形成凹槽，从而减少与工件的接触载荷 避免柄的振动（摆动），并且提供用于平滑地去除切屑和冷却水的排出路径。 此外，研磨剂的含量和接合材料的耐磨性均匀地构成，使得在烧结期间不需要考虑收缩率，并且可以简化制造过程，从而降低制造成本并提高其生产率。 此外，可以控制金属板的面积，从而能够使与工件的工作条件相一致的简单设计。