发明申请
US20050170618A1 Manufacturing method of semiconductor film and image display device
有权
半导体薄膜和图像显示装置的制造方法
- 专利标题: Manufacturing method of semiconductor film and image display device
- 专利标题(中): 半导体薄膜和图像显示装置的制造方法
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申请号: US11007188申请日: 2004-12-09
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公开(公告)号: US20050170618A1公开(公告)日: 2005-08-04
- 发明人: Mutsuko Hatano , Mikio Hongo , Akio Yazaki , Mitsuharu Tai , Takeshi Noda , Yukio Takasaki
- 申请人: Mutsuko Hatano , Mikio Hongo , Akio Yazaki , Mitsuharu Tai , Takeshi Noda , Yukio Takasaki
- 优先权: JP2004-022473 20040130
- 主分类号: G02F1/1368
- IPC分类号: G02F1/1368 ; C30B1/06 ; G02F1/133 ; H01L21/20 ; H01L21/268 ; H01L21/324 ; H01L21/336 ; H01L21/77 ; H01L21/84 ; H01L27/12 ; H01L29/04 ; H01L29/786 ; H01L21/00 ; C30B1/00 ; H01L21/36
摘要:
A semiconductor thin film is manufactured by scanning laser light or a substrate onto an arbitrary region of the semiconductor thin film and irradiating a laser thereon. The semiconductor thin film is formed by the substantially belt-shaped crystal being crystallized such that crystalline grains grow in the scanning direction, on the substrate, on XY coordinates where value x of beam size W (μm) of the laser light measured in substantially the same direction as the scanning direction is defined as X axis, and where value y of scanning velocity Vs (m/s) is defined as Y axis, the crystallization processing is performed within a region where all of the following conditions hold: condition 1: the beam size W is larger than wavelength of the laser beam, condition 2: the scanning velocity Vs is smaller than upper-limit of crystal growth speed, and condition 3: x×(1/y)
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