发明申请
US20050175780A1 Acidic solution for silver deposition and method for silver layer deposition on metal surfaces
审中-公开
用于银沉积的酸性溶液和在金属表面上沉积银层的方法
- 专利标题: Acidic solution for silver deposition and method for silver layer deposition on metal surfaces
- 专利标题(中): 用于银沉积的酸性溶液和在金属表面上沉积银层的方法
-
申请号: US10513250申请日: 2003-05-27
-
公开(公告)号: US20050175780A1公开(公告)日: 2005-08-11
- 发明人: Christian Sparing , Hartmut Mahlkow
- 申请人: Christian Sparing , Hartmut Mahlkow
- 申请人地址: DE Berlin 10553
- 专利权人: Atotech Deutschland GmbH
- 当前专利权人: Atotech Deutschland GmbH
- 当前专利权人地址: DE Berlin 10553
- 优先权: DE10226328.0 20020611
- 国际申请: PCT/EP03/05585 WO 20030527
- 主分类号: C23C18/18
- IPC分类号: C23C18/18 ; C23C18/42 ; C23F1/18 ; H05K3/24 ; B05D3/04 ; B05D1/18 ; C23C18/31
摘要:
A processing solution and a method are used for producing solderable and bondable silver layers that properties of which are not degraded even after storing, with no anti-tarnishing compounds being utilized as contrasted with prior art solutions and methods. The acidic solution for silver deposition contains silver ions and at least one Cu(I) complexing agent, said Cu(I) complexing agent being selected from the group consisting of having the structure element (I).
信息查询
IPC分类: