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发明申请
US20050211918A1 Alignment apparatus, exposure apparatus using same, and method of manufacturing devices 失效
对准装置，使用其的曝光装置以及制造装置的方法

Alignment apparatus, exposure apparatus using same, and method of manufacturing devices
摘要：
An alignment apparatus for aligning a reflective reticle includes a light source for emitting alignment light, an optical alignment mark provided on the reticle, and a reference mark provided on a reticle stage that holds the reticle. A detecting unit detects the alignment light reflected from the alignment mark and the reference mark, and the reticle is aligned on the basis of the result of detection by the detection unit.
摘要（中）：

用于对准反射标线的对准装置包括用于发射对准光的光源，设置在光罩上的光学对准标记，以及设置在保持光罩的标线片台上的参考标记。 检测单元检测从对准标记和参考标记反射的对准光，并且基于检测单元的检测结果对准标线。

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