发明申请
- 专利标题: Piezoelectric device comprising ultrahighly-orientated aluminum nitride thin film and its manufacturing method
- 专利标题(中): 包含超高取向氮化铝薄膜的压电器件及其制造方法
-
申请号: US10516333申请日: 2003-05-29
-
公开(公告)号: US20050236710A1公开(公告)日: 2005-10-27
- 发明人: Morito Akiyama , Naohiro Ueno , Hiroshi Tateyama , Yoshitaka Sunagawa , Yoshihiro Umeuchi , Keiichiro Jinushi
- 申请人: Morito Akiyama , Naohiro Ueno , Hiroshi Tateyama , Yoshitaka Sunagawa , Yoshihiro Umeuchi , Keiichiro Jinushi
- 优先权: JP2002-160568 20020531
- 国际申请: PCT/JP03/06796 WO 20030529
- 主分类号: C23C14/34
- IPC分类号: C23C14/34 ; H01L41/09 ; H01L41/18 ; H01L41/22 ; H01L41/29 ; H01L41/316 ; H01L21/28 ; H01L23/52
摘要:
The present invention has an objective to provide a high performance piezoelectric element in which is formed an aluminum nitride thin film free from hillocks, cracks, and peeling which exhibits superhigh c-axis orientation, by forming a bottom electrode from a W layer with no intervening adhesive layer on a glass or other cheap substrate. The piezoelectric element of the present invention is a piezoelectric element using a superhigh-oriented aluminum nitride thin film characterized in that the piezoelectric element is free from hillocks, cracks, and peeling and includes a stack structure in which a bottom electrode, a piezoelectric body thin film, and a top electrode are sequentially formed on a substrate; the bottom electrode is made of an oriented W layer of which a (111) plane of W is parallel to a surface of the substrate; and the piezoelectric body thin film is formed of a c-axis-oriented aluminum nitride thin film having a rocking curve full width half maximum (RCFWHM) not exceeding 2.5°.
公开/授权文献
信息查询
IPC分类: