Invention Application
- Patent Title: Device and method for lithography
- Patent Title (中): 光刻设备和方法
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Application No.: US11123087Application Date: 2005-05-06
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Publication No.: US20050274693A1Publication Date: 2005-12-15
- Inventor: Babak Heidari , Marc Beck
- Applicant: Babak Heidari , Marc Beck
- Priority: EP04445057.5 20040507
- Main IPC: B29C43/02
- IPC: B29C43/02 ; B29C43/10 ; B81C99/00 ; G03F1/00 ; G03F7/00 ; G03F7/20 ; H01L21/00

Abstract:
Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114;116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer (14).
Information query