Modified metal mold for use in imprinting processes
    1.
    发明申请
    Modified metal mold for use in imprinting processes 有权
    用于压印工艺的改性金属模具

    公开(公告)号:US20070166557A1

    公开(公告)日:2007-07-19

    申请号:US11597570

    申请日:2005-05-27

    IPC分类号: B22C3/00 B32B15/04

    摘要: The invention relates to a novel metal mold having anti-adhesive properties comprising a base metal mold and an anti-adhesive layer comprising a fluorinated alkyl phosphoric acid derivative or a fluorinated alkyl poly-phosphoric acid derivative, including a phosphorous atom and an alkyl chain. The anti-adhesive layer is bonded directly onto a surface of the base metal mold. The base metal mold may be e.g. Nickel, and said fluorinated alkyl phosphoric acid derivative or said fluorinated alkyl poly-phosphoric acid derivative may be selected from the group consisting of phosphonic acids, phosphonic acids, phosphonates and phosphonate salts, phosphonates and phosphonate salts, or their respective oligomers, such that the phosphorous atom is coupled directly to the alkyl chain, such that the phosphorous atom is coupled directly to the alkyl chain.

    摘要翻译: 本发明涉及一种具有抗粘性的新型金属模具,其特征在于包括贱金属模和包含磷原子和烷基链的氟化烷基磷酸衍生物或氟化烷基聚磷酸衍生物的防粘层。 抗粘剂层直接粘结在母模金属模的表面上。 贱金属模可以是例如。 镍和所述氟化烷基磷酸衍生物或所述氟代烷基聚磷酸衍生物可以选自膦酸,膦酸,膦酸酯和膦酸盐,膦酸盐和膦酸盐或它们各自的低聚物,使得 磷原子直接与烷基链结合,使得磷原子直接与烷基链结合。

    Device and method for lithography
    2.
    发明申请
    Device and method for lithography 审中-公开
    光刻设备和方法

    公开(公告)号:US20050274693A1

    公开(公告)日:2005-12-15

    申请号:US11123087

    申请日:2005-05-06

    摘要: Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114;116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer (14).

    摘要翻译: 用于将图案从具有结构化表面的模板(10)传送到承载可辐射聚合流体(14)的表面层的基底(12)的装置和方法。 该设备包括具有相对表面(104; 105)的第一主要部分(101)和第二主要部分(102),用于调节所述主要部分之间的间距(115),用于支撑所述模板的支撑装置(106) 在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底,设计成将辐射发射到所述间隔中的辐射源(110)。 空腔(115)具有第一壁,该第一壁包括被设计为接合所述模板或基底的柔性膜(113),并且提供装置(114; 116),用于将可调节的超压施加到存在于所述空腔中的介质,由此均匀分布 在基板和模板之间的整个接触表面上获得力。 该装置还包括具有面向所述间隔的表面的加热器装置,用于加热流体层(14)。

    Device and method for lithography
    3.
    发明授权
    Device and method for lithography 有权
    光刻设备和方法

    公开(公告)号:US07997890B2

    公开(公告)日:2011-08-16

    申请号:US11905036

    申请日:2007-09-27

    IPC分类号: B29C59/00 B28B17/00 B29B13/08

    摘要: Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114;116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer (14).

    摘要翻译: 用于将图案从具有结构化表面的模板(10)传送到承载可辐射聚合流体(14)的表面层的基底(12)的装置和方法。 该设备包括具有相对表面(104; 105)的第一主要部分(101)和第二主要部分(102),用于调节所述主要部分之间的间距(115),用于支撑所述模板的支撑装置(106) 在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底,设计成将辐射发射到所述间隔中的辐射源(110)。 空腔(115)具有第一壁,该第一壁包括被设计为接合所述模板或基底的柔性膜(113),并且提供装置(114; 116),用于将可调节的超压施加到存在于所述空腔中的介质,由此均匀分布 在基板和模板之间的整个接触表面上获得力。 该装置还包括具有面向所述间隔的表面的加热器装置,用于加热流体层(14)。

    Device and method for large area lithography
    4.
    发明申请
    Device and method for large area lithography 有权
    大面积光刻设备及方法

    公开(公告)号:US20070018362A1

    公开(公告)日:2007-01-25

    申请号:US10581497

    申请日:2004-11-03

    IPC分类号: B29C35/08 B29C45/12 B29C43/10

    摘要: Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104; 105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114; 116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template.

    摘要翻译: 用于将图案从具有结构化表面的模板(10)传送到承载可辐射聚合流体(14)的表面层的基底(12)的装置和方法。 该设备包括具有相对表面(104; 105)的第一主要部分(101)和第二主要部分(102),用于调节所述主要部分之间的间距(115),用于支撑所述模板的支撑装置(106) 在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底,设计成将辐射发射到所述间隔中的辐射源(110)。 空腔(115)具有第一壁,该第一壁包括被设计为接合所述模板或基底的柔性膜(113),并且提供装置(114; 116),用于将可调节的超压施加到存在于所述空腔中的介质,由此均匀分布 在基板和模板之间的整个接触表面上获得力。

    Pattern replication with intermediate stamp
    5.
    发明申请
    Pattern replication with intermediate stamp 有权
    带中号的图案复制

    公开(公告)号:US20060279025A1

    公开(公告)日:2006-12-14

    申请号:US11268574

    申请日:2005-11-08

    IPC分类号: B29C59/02 B29C35/08

    摘要: The invention relates to a two-step process for transferring a pattern from a template (1) to a target surface of a substrate, by creating an intermediate flexible polymer stamp (5) from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.

    摘要翻译: 本发明涉及通过在初级步骤中从模板中生成中间柔性聚合物印模(5),然后使用聚合物(2),将图案从模板(1)转移到基材的目标表面的两步法 在第二步骤中对目标表面上的辐射敏感的可成型层进行印记。 在第二步骤中,将聚合物印模和基板彼此挤压,通过聚合物印模的可模制层的UV曝光和辐射的可模塑层的后烘烤的工艺步骤全部按照控制恒温进行 以消除由热膨胀效应引起的在可模塑层中产生的图案的损坏。

    Device and method for large area lithography
    6.
    发明授权
    Device and method for large area lithography 有权
    大面积光刻设备及方法

    公开(公告)号:US08147235B2

    公开(公告)日:2012-04-03

    申请号:US10581497

    申请日:2004-11-03

    IPC分类号: A01J21/00

    摘要: Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104; 105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114; 116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template.

    摘要翻译: 用于将图案从具有结构化表面的模板(10)传送到承载可辐射聚合流体(14)的表面层的基底(12)的装置和方法。 该设备包括具有相对表面(104; 105)的第一主要部分(101)和第二主要部分(102),用于调节所述主要部分之间的间距(115),用于支撑所述模板的支撑装置(106) 在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底,设计成将辐射发射到所述间隔中的辐射源(110)。 空腔(115)具有第一壁,该第一壁包括被设计为接合所述模板或基底的柔性膜(113),并且提供装置(114; 116),用于将可调节的超压施加到存在于所述空腔中的介质,由此均匀分布 在基板和模板之间的整个接触表面上获得力。

    Metal mold for use in imprinting processes
    7.
    发明授权
    Metal mold for use in imprinting processes 有权
    金属模具用于压印工艺

    公开(公告)号:US08119197B2

    公开(公告)日:2012-02-21

    申请号:US12751239

    申请日:2010-03-31

    IPC分类号: C23C16/00 B05D3/00

    摘要: The invention relates to a novel metal mold having anti-adhesive properties comprising a base metal mold and an anti-adhesive layer comprising a fluorinated alkyl phosphoric acid derivative or a fluorinated alkyl poly-phosphoric acid derivative, including a phosphorous atom and an alkyl chain. The anti-adhesive layer is bonded directly onto a surface of the base metal mold. The base metal mold may be e.g. Nickel, and said fluorinated alkyl phosphoric acid derivative or said fluorinated alkyl poly-phosphoric acid derivative may be selected front the group consisting of phosphonic acids, phosphinic acids, phosphonates and phosphonate salts, phosphinates and phosphinate salts, or their respective oligomers, such that the phosphorous atom is coupled directly to the alkyl chain, such that the phosphorous atom is coupled directly to the alkyl chain.

    摘要翻译: 本发明涉及一种具有抗粘性的新型金属模具,其特征在于包括贱金属模和包含磷原子和烷基链的氟化烷基磷酸衍生物或氟化烷基多磷酸衍生物的防粘层。 抗粘剂层直接粘结在母模金属模的表面上。 贱金属模可以是例如。 镍和所述氟化烷基磷酸衍生物或所述氟代烷基聚磷酸衍生物可以选自由膦酸,次膦酸,膦酸盐和膦酸盐,次膦酸盐和次膦酸盐或它们各自的低聚物组成的组, 磷原子直接与烷基链结合,使得磷原子直接与烷基链结合。

    Method for imprint lithography at constant temperature
    8.
    发明授权
    Method for imprint lithography at constant temperature 有权
    恒温压印光刻方法

    公开(公告)号:US07972553B2

    公开(公告)日:2011-07-05

    申请号:US11579540

    申请日:2004-11-25

    IPC分类号: B29C35/02 B29C35/08

    摘要: Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tp by means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and—postbaking the layer.

    摘要翻译: 用于将图案从具有结构化表面(11)的模板(10)转移到承载设计为5的材料的表面层(14)的基底(12)的方法,其在暴露于辐射时固化,包括:布置所述模板和基底 在压印装置中相互平行,所述结构化表面面向所述表面层; 通过加热器装置(20)将模板和衬底加热至温度Tp; 并且在保持所述温度Tp的同时,执行以下步骤:将模板压向基板以将所述图案压印到所述层中; 将所述层暴露于辐射(19)以固化该层,并且对该层进行后烘烤。

    Multilayer nano imprint lithography
    9.
    发明申请
    Multilayer nano imprint lithography 审中-公开
    多层纳米压印光刻

    公开(公告)号:US20080138460A1

    公开(公告)日:2008-06-12

    申请号:US12007750

    申请日:2008-01-15

    IPC分类号: B28B1/00

    摘要: An improved method for nanoimprint lithography and more specifically for providing a nano-scale pattern on a substrate is disclosed. According to the improvement, a mould (100) and a substrate (115) are provided wherein the substrate (115) is provided with a plurality of coating layers (120, 125, 130) before pressing the mould (100) and substrate (115) together for transferring a pattern from the mould (100) to the substrate (115). According to the invention, the substrate is provided with an uppermost layer (130) having a pure anti-adhesive function.

    摘要翻译: 公开了一种用于纳米压印光刻的改进方法,并且更具体地用于在衬底上提供纳米级图案。 根据改进,提供了一种模具(100)和基板(115),其中在压制模具(100)和基板(115)之前,基板(115)设置有多个涂层(120,125,130) )一起用于将图案从模具(100)传送到基板(115)。 根据本发明,衬底设置有具有纯粹的抗粘附功能的最上层(130)。

    Multilayer nano imprint lithography
    10.
    发明申请
    Multilayer nano imprint lithography 审中-公开
    多层纳米压印光刻

    公开(公告)号:US20060040058A1

    公开(公告)日:2006-02-23

    申请号:US10992322

    申请日:2004-11-19

    IPC分类号: B05D3/12

    摘要: An improved method for nanoimprint lithography and more specifically for providing a nano-scale pattern on a substrate is disclosed. According to the improvement, a mould (100) and a substrate (115) are provided wherein the substrate (115) is provided with a plurality of coating layers (120, 125, 130) before pressing the mould (100) and substrate (115) together for transferring a pattern from the mould (100) to the substrate (115). According to the invention, the substrate is provided with an uppermost layer (130) having a pure anti-adhesive function.

    摘要翻译: 公开了一种用于纳米压印光刻的改进方法,并且更具体地用于在衬底上提供纳米级图案。 根据改进,提供了一种模具(100)和基板(115),其中在压制模具(100)和基板(115)之前,基板(115)设置有多个涂层(120,125,130) )一起用于将图案从模具(100)传送到基板(115)。 根据本发明,衬底设置有具有纯粹的抗粘附功能的最上层(130)。