发明申请
US20060049411A1 Method for fabricating group-III nitride devices and devices fabricated using method
有权
使用方法制造III族氮化物器件的方法和器件
- 专利标题: Method for fabricating group-III nitride devices and devices fabricated using method
- 专利标题(中): 使用方法制造III族氮化物器件的方法和器件
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申请号: US10848937申请日: 2004-05-18
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公开(公告)号: US20060049411A1公开(公告)日: 2006-03-09
- 发明人: Shuji Nakamura , Steven DenBaars , John Edmond , Chuck Swoboda , Umesh Mishra
- 申请人: Shuji Nakamura , Steven DenBaars , John Edmond , Chuck Swoboda , Umesh Mishra
- 专利权人: CREE, INC.
- 当前专利权人: CREE, INC.
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L21/00
摘要:
A method according to the present invention for fabricating high light extraction photonic devices comprising growing an epitaxial semiconductor structure on a substrate and depositing a first mirror layer on the epitaxial semiconductor structure such that the epitaxial semiconductor structure is sandwiched between the first mirror layer and the substrate. Flip-chip mounting the epitaxial semiconductor structure, with its first mirror and substrate on a submount such that the epitaxial semiconductor device structure is sandwiched between the submount and substrate. The substrate is then removed from the epitaxial structure by introducing an etch environment to the substrate. A second mirror layer is deposited on the epitaxial semiconductor structure such that the epitaxial semiconductor structure is sandwiched between the first and second mirror layers. A device according to the present invention comprising a resonant cavity light emitting diode (RCLED) mounted to a submount.
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