Invention Application
US20060140343A1 In-situ X-ray diffraction system using sources and detectors at fixed angular positions
有权
在固定角度位置使用源和探测器的原位X射线衍射系统
- Patent Title: In-situ X-ray diffraction system using sources and detectors at fixed angular positions
- Patent Title (中): 在固定角度位置使用源和探测器的原位X射线衍射系统
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Application No.: US11346699Application Date: 2006-02-03
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Publication No.: US20060140343A1Publication Date: 2006-06-29
- Inventor: David Gibson , Walter Gibson , Huapeng Huang
- Applicant: David Gibson , Walter Gibson , Huapeng Huang
- Applicant Address: US NY East Greenbush
- Assignee: X-Ray Optical Systems, Inc.
- Current Assignee: X-Ray Optical Systems, Inc.
- Current Assignee Address: US NY East Greenbush
- Main IPC: G01N23/20
- IPC: G01N23/20

Abstract:
An x-ray diffraction technique for measuring a known characteristic of a sample of a material in an in-situ state. The technique includes using an x-ray source for emitting substantially divergent x-ray radiation—with a collimating optic disposed with respect to the fixed source for producing a substantially parallel beam of x-ray radiation by receiving and redirecting the divergent paths of the divergent x-ray radiation. A first x-ray detector collects radiation diffracted from the sample; wherein the source and detector are fixed, during operation thereof, in position relative to each other and in at least one dimension relative to the sample according to a-priori knowledge about the known characteristic of the sample. A second x-ray detector may be fixed relative to the first x-ray detector according to the a-priori knowledge about the known characteristic of the sample, especially in a phase monitoring embodiment of the present invention.
Public/Granted literature
- US07236566B2 In-situ X-ray diffraction system using sources and detectors at fixed angular positions Public/Granted day:2007-06-26
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