发明申请
US20060140343A1 In-situ X-ray diffraction system using sources and detectors at fixed angular positions
有权
在固定角度位置使用源和探测器的原位X射线衍射系统
- 专利标题: In-situ X-ray diffraction system using sources and detectors at fixed angular positions
- 专利标题(中): 在固定角度位置使用源和探测器的原位X射线衍射系统
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申请号: US11346699申请日: 2006-02-03
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公开(公告)号: US20060140343A1公开(公告)日: 2006-06-29
- 发明人: David Gibson , Walter Gibson , Huapeng Huang
- 申请人: David Gibson , Walter Gibson , Huapeng Huang
- 申请人地址: US NY East Greenbush
- 专利权人: X-Ray Optical Systems, Inc.
- 当前专利权人: X-Ray Optical Systems, Inc.
- 当前专利权人地址: US NY East Greenbush
- 主分类号: G01N23/20
- IPC分类号: G01N23/20
摘要:
An x-ray diffraction technique for measuring a known characteristic of a sample of a material in an in-situ state. The technique includes using an x-ray source for emitting substantially divergent x-ray radiation—with a collimating optic disposed with respect to the fixed source for producing a substantially parallel beam of x-ray radiation by receiving and redirecting the divergent paths of the divergent x-ray radiation. A first x-ray detector collects radiation diffracted from the sample; wherein the source and detector are fixed, during operation thereof, in position relative to each other and in at least one dimension relative to the sample according to a-priori knowledge about the known characteristic of the sample. A second x-ray detector may be fixed relative to the first x-ray detector according to the a-priori knowledge about the known characteristic of the sample, especially in a phase monitoring embodiment of the present invention.
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