发明申请
- 专利标题: Gallium nitride semiconductor device
- 专利标题(中): 氮化镓半导体器件
-
申请号: US11030554申请日: 2005-01-06
-
公开(公告)号: US20060145283A1公开(公告)日: 2006-07-06
- 发明人: TingGang Zhu , Bryan Shelton , Marek Pabisz , Mark Gottfried , Linlin Liu , Milan Pophristic , Michael Murphy , Richard Stall
- 申请人: TingGang Zhu , Bryan Shelton , Marek Pabisz , Mark Gottfried , Linlin Liu , Milan Pophristic , Michael Murphy , Richard Stall
- 主分类号: H01L27/095
- IPC分类号: H01L27/095 ; H01L21/338
摘要:
A gallium nitride based semiconductor Schottky diode fabricated from a n+ doped GaN layer having a thickness between one and six microns disposed on a sapphire substrate; an n− doped GaN layer having a thickness greater than one micron disposed on said n+ GaN layer patterned into a plurality of elongated fingers and a metal layer disposed on the n− doped GaN layer and forming a Schottky junction therewith. The layer thicknesses and the length and width of the elongated fingers are optimized to achieve a device with breakdown voltage of greater than 500 volts, current capacity in excess of one ampere, and a forward voltage of less than three volts.
公开/授权文献
- US07436039B2 Gallium nitride semiconductor device 公开/授权日:2008-10-14
信息查询
IPC分类: