发明申请
US20070113423A1 Drying apparatus, drying method, substrate processing apparatus, substrate processing method, and program recording medium 有权
干燥装置,干燥方法,基板处理装置,基板处理方法和程序记录介质

Drying apparatus, drying method, substrate processing apparatus, substrate processing method, and program recording medium
摘要:
The present invention provides a drying apparatus capable of satisfactorily drying a workpiece by using a dry vapor The drying apparatus has a control device for controlling a supply of a carrier gas and a supply of a dry vapor into a processing tank holding workpieces. A drying process carries out a carrier gas supply step of supplying the carrier gas and a mixed fluid supply step of supplying a mixed fluid prepared by mixing the carrier gas and the dry vapor alternately. A total mixed fluid supply time for which the mixed fluid supply step is executed is not shorter than 57% of a total processing time for which the carrier gas supply step and the mixed fluid supply step are executed.
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