公开(公告)号：US07581335B2

公开(公告)日：2009-09-01

申请号：US11594232

申请日：2006-11-08

申请人： Hiroshi Tanaka ,  Hidetoshi Nakao ,  Naoki Shindo ,  Atushi Yamashita ,  Tsukasa Hirayama ,  Kotaro Tsurusaki

发明人： Hiroshi Tanaka ,  Hidetoshi Nakao ,  Naoki Shindo ,  Atushi Yamashita ,  Tsukasa Hirayama ,  Kotaro Tsurusaki

IPC分类号： F26B7/00

CPC分类号： H01L21/67028 ,  H01L21/67034 ,  Y10S118/90 ,  Y10S134/902

摘要： The present invention provides a drying apparatus capable of satisfactorily drying a workpiece by using a dry vapor The drying apparatus has a control device for controlling a supply of a carrier gas and a supply of a dry vapor into a processing tank holding workpieces. A drying process carries out a carrier gas supply step of supplying the carrier gas and a mixed fluid supply step of supplying a mixed fluid prepared by mixing the carrier gas and the dry vapor alternately. A total mixed fluid supply time for which the mixed fluid supply step is executed is not shorter than 57% of a total processing time for which the carrier gas supply step and the mixed fluid supply step are executed.

摘要翻译： 本发明提供一种干燥装置，其能够通过使用干燥蒸汽令工件干燥良好。干燥装置具有控制装置，用于控制载气的供给和干燥蒸气的供给到保持工件的处理罐中。 干燥工序进行供给载气的载气供给工序以及混合流体供给工序，供给通过交替地混合载气和干燥蒸气而制备的混合流体。 执行混合流体供给步骤的总混合流体供给时间不低于执行载气供给步骤和混合流体供给步骤的总处理时间的57％。

公开(公告)号：US20070113423A1

公开(公告)日：2007-05-24

申请号：US11594232

申请日：2006-11-08

申请人： Hiroshi Tanaka ,  Hidetoshi Nakao ,  Naoki Shindo ,  Atushi Yamashita ,  Tsukasa Hirayama ,  Kotaro Tsurusaki

发明人： Hiroshi Tanaka ,  Hidetoshi Nakao ,  Naoki Shindo ,  Atushi Yamashita ,  Tsukasa Hirayama ,  Kotaro Tsurusaki

IPC分类号： F26B3/00

CPC分类号： H01L21/67028 ,  H01L21/67034 ,  Y10S118/90 ,  Y10S134/902

摘要： The present invention provides a drying apparatus capable of satisfactorily drying a workpiece by using a dry vapor The drying apparatus has a control device for controlling a supply of a carrier gas and a supply of a dry vapor into a processing tank holding workpieces. A drying process carries out a carrier gas supply step of supplying the carrier gas and a mixed fluid supply step of supplying a mixed fluid prepared by mixing the carrier gas and the dry vapor alternately. A total mixed fluid supply time for which the mixed fluid supply step is executed is not shorter than 57% of a total processing time for which the carrier gas supply step and the mixed fluid supply step are executed.

摘要翻译： 本发明提供一种干燥装置，其能够通过使用干燥蒸汽令工件干燥良好。干燥装置具有控制装置，用于控制载气的供给和干燥蒸气的供给到保持工件的处理罐中。 干燥工序进行供给载气的载气供给工序以及混合流体供给工序，供给通过交替地混合载气和干燥蒸气而制备的混合流体。 执行混合流体供给步骤的总混合流体供给时间不低于执行载气供给步骤和混合流体供给步骤的总处理时间的57％。

公开(公告)号：US20060060232A1

公开(公告)日：2006-03-23

申请号：US10540762

申请日：2005-03-30

申请人： Kotaro Tsurusaki ,  Hiroshi Tanaka ,  Takayuki Toshima ,  Kazuyoshi Eshima

发明人： Kotaro Tsurusaki ,  Hiroshi Tanaka ,  Takayuki Toshima ,  Kazuyoshi Eshima

IPC分类号： B08B3/00

CPC分类号： H01L21/67086 ,  H01L21/6708

摘要： A plurality of process liquid supply nozzles 10 are arranged at different levels on right and left sides of a semiconductor wafer W in a process bath 1. A discharge port of each of the nozzles 10 is directed toward the semiconductor wafer W. In accordance with a predetermined procedure, a process liquid is discharged from one or more nozzles 10 selected from the plurality of nozzles 10. In order to perform a chemical liquid treatment, a chemical liquid is discharged from the lowermost nozzle 10, for example, and thereafter, the nozzles 10 on the upper levels sequentially discharge the chemical liquid. In order to perform a rinse liquid treatment by replacing the chemical liquid in the process bath 1 with a rinse liquid, the rinse liquid is discharged from the lowermost nozzle 10 at first, for example. Thereafter, the rinse liquid is discharged from all the nozzles 10. In this manner, efficiency and uniformity in the liquid treatment can be improved.

摘要翻译： 多个处理液供给喷嘴10在处理槽1中的半导体晶片W的左右两侧以不同的水平配置。各喷嘴10的排出口朝向半导体晶片W.按照 从多个喷嘴10中选择的一个以上的喷嘴10排出处理液。为了进行药液处理，例如从最下面的喷嘴10喷出化学液，之后，喷嘴 10上方依次排出化学液体。 为了通过用冲洗液更换处理槽1中的化学液体进行冲洗液处理，首先例如从最下面的喷嘴10排出冲洗液。 此后，冲洗液体从所有喷嘴10排出。这样可以提高液体处理的效率和均匀性。

公开(公告)号：US08652344B2

公开(公告)日：2014-02-18

申请号：US12403286

申请日：2009-03-12

申请人： Kotaro Tsurusaki ,  Hiroshi Tanaka ,  Takayuki Toshima ,  Kazuyoshi Eshima

发明人： Kotaro Tsurusaki ,  Hiroshi Tanaka ,  Takayuki Toshima ,  Kazuyoshi Eshima

IPC分类号： B44C1/22

CPC分类号： H01L21/67086 ,  H01L21/6708

摘要： A plurality of process liquid supply nozzles 10 are arranged at different levels on right and left sides of a semiconductor wafer W in a process bath 1. A discharge port of each of the nozzles 10 is directed toward the semiconductor wafer W. In accordance with a predetermined procedure, a process liquid is discharged from one or more nozzles 10 selected from the plurality of nozzles 10. In order to perform a chemical liquid treatment, a chemical liquid is discharged from the lowermost nozzle 10, for example, and thereafter, the nozzles 10 on the upper levels sequentially discharge the chemical liquid. In order to perform a rinse liquid treatment by replacing the chemical liquid in the process bath 1 with a rinse liquid, the rinse liquid is discharged from the lowermost nozzle 10 at first, for example. Thereafter, the rinse liquid is discharged from all the nozzles 10. In this manner, efficiency and uniformity in the liquid treatment can be improved.

摘要翻译： 多个处理液供给喷嘴10在处理槽1中的半导体晶片W的左右两侧以不同的水平配置。各喷嘴10的排出口朝向半导体晶片W.按照 从多个喷嘴10中选择的一个以上的喷嘴10排出处理液。为了进行药液处理，例如从最下面的喷嘴10喷出化学液，之后，喷嘴 10上方依次排出化学液体。 为了通过用冲洗液更换处理槽1中的化学液体进行冲洗液处理，首先例如从最下面的喷嘴10排出冲洗液。 此后，冲洗液体从所有喷嘴10排出。这样可以提高液体处理的效率和均匀性。

公开(公告)号：US09773597B2

公开(公告)日：2017-09-26

申请号：US13979988

申请日：2012-02-22

申请人： Hiroaki Ikeda ,  Hiroshi Tanaka ,  Kazunori Igarashi

发明人： Hiroaki Ikeda ,  Hiroshi Tanaka ,  Kazunori Igarashi

IPC分类号： H01F1/24 ,  H01F41/02 ,  B22F1/02 ,  B22F3/16 ,  C22C33/02 ,  C22C38/02 ,  H01F3/08 ,  H01F27/255 ,  H01F1/26 ,  H01F1/33

CPC分类号： H01F1/24 ,  B22F1/02 ,  B22F1/025 ,  B22F3/16 ,  B22F3/24 ,  B22F2998/10 ,  B22F2999/00 ,  C22C33/0214 ,  C22C33/0278 ,  C22C38/02 ,  C22C2202/02 ,  H01F1/26 ,  H01F1/33 ,  H01F3/08 ,  H01F27/255 ,  H01F41/0246 ,  B22F3/02 ,  B22F2003/248 ,  B22F2201/02 ,  B22F2201/20

摘要： A composite soft magnetic material having low magnetostriction and high magnetic flux density contains: pure iron-based composite soft magnetic powder particles that are subjected to an insulating treatment by a Mg-containing insulating film or a phosphate film; and Fe—Si alloy powder particles including 11%-16% by mass of Si. A ratio of an amount of the Fe—Si alloy powder particles to a total amount is in a range of 10%-60% by mass. A method for producing the composite soft magnetic material comprises the steps of: mixing a pure iron-based composite soft magnetic powder, and the Fe—Si alloy powder in such a manner that a ratio of the Fe—Si alloy powder to a total amount is in a range of 10%-60%; subjecting a resultant mixture to compression molding; and subjecting a resultant molded body to a baking treatment in a non-oxidizing atmosphere.

公开(公告)号：US09399189B2

公开(公告)日：2016-07-26

申请号：US14004708

申请日：2012-04-11

申请人： Tatsuya Tsujiuchi ,  Hiroshi Tanaka ,  Hiromitsu Nagayasu ,  Takuya Hirata ,  Tsuyoshi Oishi ,  Masahiko Tatsumi ,  Koji Kadono

发明人： Tatsuya Tsujiuchi ,  Hiroshi Tanaka ,  Hiromitsu Nagayasu ,  Takuya Hirata ,  Tsuyoshi Oishi ,  Masahiko Tatsumi ,  Koji Kadono

IPC分类号： B01D53/14

CPC分类号： B01D53/1425 ,  B01D53/1406 ,  B01D53/1475 ,  B01D2252/204 ,  B01D2257/504 ,  B01D2258/0283 ,  Y02A50/2342 ,  Y02C10/04 ,  Y02C10/06

摘要： A CO2 recovery device includes a cooling tower including a cooling unit for bringing the flue gas, which contains CO2, into contact with water so as to cool flue gas; a CO2-absorbing unit for bringing the flue gas into contact with a CO2 absorbent (lean solution) so as to remove CO2 from flue gas; and a regenerator including an absorbent regenerating unit for releasing CO2 from a rich solution so as to regenerate the CO2 absorbent. The CO2-absorbing unit includes: a cocurrent flow CO2-absorbing unit provided in a cocurrent flow CO2 absorber, for bringing the flue gas into contact with the CO2 absorbent in a cocurrent flow so as to remove CO2 from flue gas and a countercurrent CO2-absorbing unit provided in a CO2 absorber, for bringing the flue gas into contact with the CO2 absorbent in a countercurrent flow so as to remove CO2 from flue gas.

摘要翻译： CO 2回收装置包括：冷却塔，其包括用于使含有CO 2的烟道气与水接触以冷却烟道气的冷却单元; 用于使烟道气与CO 2吸收剂（贫溶液）接触以便从烟道气中除去CO 2的CO 2吸收单元; 以及再生器，其包括用于从富溶液中释放CO 2以便再生CO 2吸收剂的吸收剂再生单元。 二氧化碳吸收单元包括：并流CO2吸收单元，其设置在并流CO2吸收器中，用于使烟道气与CO 2吸收剂以并流方式接触，以便从烟气中除去CO 2和逆流CO2- 提供在CO 2吸收器中的吸收单元，用于使烟气以逆流流动与CO 2吸收剂接触，以便从烟道气中除去CO 2。

公开(公告)号：US09340117B2

公开(公告)日：2016-05-17

申请号：US13814154

申请日：2011-07-29

申请人： Nobuo Momose ,  Makoto Kataniwa ,  Yasuhiro Nakai ,  Hiroyuki Kumazawa ,  Tatsuji Munaka ,  Yoshitaka Okazaki ,  Yuichiro Shimura ,  Hiroshi Tanaka ,  Hiroshi Irie ,  Hitoshi Maejima

发明人： Nobuo Momose ,  Makoto Kataniwa ,  Yasuhiro Nakai ,  Hiroyuki Kumazawa ,  Tatsuji Munaka ,  Yoshitaka Okazaki ,  Yuichiro Shimura ,  Hiroshi Tanaka ,  Hiroshi Irie ,  Hitoshi Maejima

IPC分类号： G06F19/00 ,  B60L11/18 ,  H02J3/32

CPC分类号： B60L11/1838 ,  B60L11/1816 ,  B60L11/1824 ,  B60L11/1825 ,  B60L11/184 ,  B60L11/1842 ,  B60L11/1844 ,  B60L11/1846 ,  B60L11/1877 ,  B60L2210/30 ,  B60L2230/22 ,  B60L2230/24 ,  B60L2230/40 ,  B60L2240/545 ,  B60L2240/70 ,  B60L2250/16 ,  H02J3/28 ,  H02J3/32 ,  Y02E60/721 ,  Y02T10/7005 ,  Y02T10/705 ,  Y02T10/7088 ,  Y02T10/7241 ,  Y02T10/7291 ,  Y02T90/121 ,  Y02T90/127 ,  Y02T90/128 ,  Y02T90/14 ,  Y02T90/16 ,  Y02T90/163 ,  Y02T90/168 ,  Y02T90/169 ,  Y04S10/126 ,  Y04S30/12 ,  Y04S30/14

摘要： The invention judges a total power supply/demand condition of the electricity consumers 2 as a whole according to an individual power supply/demand condition of electricity consumers 2, judges a total usable capacity of all batteries 17 according to a usable capacity of the batteries 17 of electric vehicles 10 parked at electricity consumers 2, obtains required charge/discharge amounts of all the batteries 17 according to a result of comparison of the total power supply/demand condition of the electricity consumers 2 as a whole with the total usable capacity of all the batteries 17, subjects the batteries 17 to charge/discharge controls according to the required charge/discharge amounts, the power supply/demand conditions of the electricity consumers 2, and the usable capacities of the batteries.

摘要翻译： 根据电力用户2的个体供电条件，本发明判断电力用户2整体的总供电状况，根据电池17的可使用容量来判断全部电池17的总可使用容量 停电在电力用户2上的电动车辆10，根据电力用户2的整体供电/供给状况的比较结果与所有电池17的总可用容量的比较结果，获得所有电池17的所需充放电量 电池17根据所需的充电/放电量，电力用户2的供电/需求条件以及电池的可用容量对电池17进行充放电控制。

公开(公告)号：US09264332B2

公开(公告)日：2016-02-16

申请号：US14129075

申请日：2012-06-12

申请人： Akira Sakurai ,  Hiroshi Tanaka ,  Masaki Umayabashi

发明人： Akira Sakurai ,  Hiroshi Tanaka ,  Masaki Umayabashi

IPC分类号： G01R31/08 ,  G06F11/00 ,  G08C15/00 ,  H04L12/26

CPC分类号： H04L43/0829 ,  H04L43/0835 ,  H04L43/0841 ,  H04L43/0852 ,  H04L43/106

摘要： In a transmission system capable of measuring packet loss ratio between arbitrary devices upon a transmission path without increasing bandwidth of an OAM frame band, a plurality of transmission devices which have been disposed upon a transmission path are provided with a frame analysis unit which receives data frames so as to analyze the type of the data frames, a count processing unit which stores the number of received frames included in the data frames into storage module provided beforehand, an output line end portion which outputs the data frames, and an OAM processing unit which calculates the packet loss ratio in the transmission path using the number of received frames. The frame analysis unit has a function which, if the data frames are OAM frames, copies the data frames and the OAM processing unit has a function which calculates the packet loss ratio using the copied OAM frames.

摘要翻译： 在能够测量传输路径上的任意设备之间的分组丢失率而不增加OAM帧频带宽的传输系统中，设置在传输路径上的多个传输设备设置有帧分析单元，其接收数据帧 为了分析数据帧的类型，将数据帧中包含的接收帧的数量存储在预先提供的存储模块中的计数处理单元，输出数据帧的输出线路端部分和OAM处理单元， 使用接收帧的数量来计算传输路径中的丢包率。 帧分析单元具有这样的功能：如果数据帧是OAM帧，则复制数据帧，并且OAM处理单元具有使用复制的OAM帧来计算分组丢失率的功能。

公开(公告)号：US09070549B2

公开(公告)日：2015-06-30

申请号：US12680799

申请日：2008-09-22

申请人： Hiroshi Tanaka ,  Toshiyuki Shiokawa ,  Takao Inada

发明人： Hiroshi Tanaka ,  Toshiyuki Shiokawa ,  Takao Inada

IPC分类号： B08B5/02 ,  H01L21/02 ,  H01L21/67

CPC分类号： H01L21/02052 ,  H01L21/67028

摘要： A drying gas is supplied into a drying chamber in a substantially horizontal direction, an obliquely downward direction descendent from the substantially horizontal direction, or a vertically downward direction under a state where a wafer is immersed in a cleaning liquid in a cleaning tank. The wafer is moved from the cleaning tank into the drying chamber, with the drying gas being supplied into the drying chamber. At this time, the supply of the drying gas into the drying chamber is stopped, under a condition where a part of the wafer is immersed in the cleaning liquid stored in the cleaning tank. After the movement of the wafer into the drying chamber has been finished, a drying gas is supplied into the drying chamber in an obliquely upward direction ascendant from the substantially horizontal direction or a vertically upward direction.

摘要翻译： 在将晶片浸入清洗槽中的清洗液体的状态下，将干燥气体从大致水平方向或垂直向下方向向大致水平方向，倾斜向下方向供给到干燥室。 将晶片从清洁槽移动到干燥室中，其中干燥气体被供应到干燥室中。 此时，在将晶片的一部分浸渍在存储在清洗槽中的清洗液中的状态下，将干燥气体供给到干燥室内停止。 在将晶片移动到干燥室中之后，干燥气体从大致水平方向或垂直向上方向上升的斜上方向供给干燥室。

公开(公告)号：US09000126B2

公开(公告)日：2015-04-07

申请号：US13642356

申请日：2011-04-21

申请人： Ken Kimura ,  Kenta Fukumoto ,  Hiroshi Tanaka

发明人： Ken Kimura ,  Kenta Fukumoto ,  Hiroshi Tanaka

IPC分类号： C07K5/08 ,  C07K5/02

CPC分类号： C07K5/0215 ,  C30B7/08 ,  C30B29/54

摘要： Provided is a novel crystal of oxidized glutathione hexahydrate. Crystal of oxidized glutathione hexahydrate is produced by cooling an aqueous solution containing oxidized glutathione to 15° C. or lower to precipitate a crystal of oxidized glutathione hexahydrate.

摘要翻译： 提供了一种新型的氧化型谷胱甘肽六水合物晶体。 通过将含有氧化型谷胱甘肽的水溶液冷却至15℃以下，生成氧化型谷胱甘肽六水合物的晶体，使氧化型谷胱甘肽六水合物的结晶析出。