发明申请
US20080050861A1 Microelectromechanical Systems Encapsulation Process with Anti-Stiction Coating 有权
具有抗静电涂层的微机电系统封装工艺

Microelectromechanical Systems Encapsulation Process with Anti-Stiction Coating
摘要:
An encapsulated MEMS process including a high-temperature anti-stiction coating that is stable under processing steps at temperatures over 450° C. is described. The coating is applied after device release but before sealing vents in the encapsulation layer. Alternatively, an anti-stiction coating may be applied to released devices directly before encapsulation.
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