发明申请
- 专利标题: INTEGRATED CIRCUIT INCLUDING A GATE ELECTRODE
- 专利标题(中): 集成电路,包括门电极
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申请号: US11926653申请日: 2007-10-29
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公开(公告)号: US20080054324A1公开(公告)日: 2008-03-06
- 发明人: Richard Luyken , Franz Hofmann , Lothar Risch , Dirk Manger , Wolfgang Rosner , Till Schloesser , Michael Specht
- 申请人: Richard Luyken , Franz Hofmann , Lothar Risch , Dirk Manger , Wolfgang Rosner , Till Schloesser , Michael Specht
- 申请人地址: DE Neubiberg 85531
- 专利权人: INFINEON TECHNOLOGIES AG
- 当前专利权人: INFINEON TECHNOLOGIES AG
- 当前专利权人地址: DE Neubiberg 85531
- 优先权: DE10320239.0 20030507
- 主分类号: H01L29/94
- IPC分类号: H01L29/94
摘要:
An integrated circuit including a gate electrode is disclosed. One embodiment provides a transistor including a first source/drain electrode and a second source/drain electrode. A channel is arranged between the first and the second source/drain electrode in a semiconductor substrate. A gate electrode is arranged adjacent the channel layer and is electrically insulated from the channel layer. A semiconductor substrate electrode is provided on a rear side. The gate electrode encloses the channel layer at at least two opposite sides.
公开/授权文献
- US07829892B2 Integrated circuit including a gate electrode 公开/授权日:2010-11-09
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