发明申请
US20080123082A1 APC SYSTEM AND MULTIVARIATE MONITORING METHOD FOR PLASMA PROCESS MACHINE
有权
APC系统和等离子体处理机多重监测方法
- 专利标题： APC SYSTEM AND MULTIVARIATE MONITORING METHOD FOR PLASMA PROCESS MACHINE
- 专利标题（中）： APC系统和等离子体处理机多重监测方法
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申请号： US11737541申请日： 2007-04-19
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公开(公告)号： US20080123082A1公开(公告)日： 2008-05-29
- 发明人: Tuung LUOH , Shing-Ann Luo , Chin-Ta Su , Ta-Hung Yang , Kuang-Chao Chen
- 申请人： Tuung LUOH , Shing-Ann Luo , Chin-Ta Su , Ta-Hung Yang , Kuang-Chao Chen
- 申请人地址： TW Hsinchu
- 专利权人： MACRONIX INTERNATIONAL CO., LTD.
- 当前专利权人： MACRONIX INTERNATIONAL CO., LTD.
- 当前专利权人地址： TW Hsinchu
- 优先权： TW95144168 20061129
- 主分类号： G01N21/00
- IPC分类号： G01N21/00
摘要：
An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system.
公开/授权文献
- US08085390B2 Multivariate monitoring method for plasma process machine 公开/授权日：2011-12-27