发明申请
US20080206949A1 APPARATUS FOR FORMING CONDUCTOR, METHOD FOR FORMING CONDUCTOR, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
审中-公开
用于形成导体的装置,形成导体的方法和制造半导体器件的方法
- 专利标题: APPARATUS FOR FORMING CONDUCTOR, METHOD FOR FORMING CONDUCTOR, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- 专利标题(中): 用于形成导体的装置,形成导体的方法和制造半导体器件的方法
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申请号: US11845615申请日: 2007-08-27
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公开(公告)号: US20080206949A1公开(公告)日: 2008-08-28
- 发明人: Eiichi Kondoh , Michiru Hirose , Hitoshi Tanaka , Masayuki Satoh , Hisashi Yano , Masaki Yoshimaru
- 申请人: Eiichi Kondoh , Michiru Hirose , Hitoshi Tanaka , Masayuki Satoh , Hisashi Yano , Masaki Yoshimaru
- 申请人地址: JP Yokohama-shi
- 专利权人: SEMICONDUCTOR TECHNOLOGY ACADEMIC RESEARCH CENTER
- 当前专利权人: SEMICONDUCTOR TECHNOLOGY ACADEMIC RESEARCH CENTER
- 当前专利权人地址: JP Yokohama-shi
- 优先权: JP2007-050362 20070228; JP2007-211877 20070815
- 主分类号: H01L21/44
- IPC分类号: H01L21/44 ; B05C11/00
摘要:
A conductor forming apparatus includes a reaction container having housed therein a processing target on a surface of which a recess in which a conductor is to be provided is formed, and a process for providing the conductor in the recess being carried out inside the container after a supercritical fluid dissolved with a metal compound is supplied into the container, a supply device which supplies the fluid from an outside to the inside of the container, and a discharge device which discharges the fluid that is not submitted for the process from the inside to the outside of the container, wherein while an amount of the fluid in the container is adjusted by continuously supplying the fluid into the container by the supply device and continuously discharging the fluid that is not submitted for the process to the outside of the container by the discharge device.
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