发明申请
US20080231823A1 Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus
审中-公开
用于减少浸没式光刻设备浸没液体逸出的装置和方法
- 专利标题: Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus
- 专利标题(中): 用于减少浸没式光刻设备浸没液体逸出的装置和方法
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申请号: US12076501申请日: 2008-03-19
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公开(公告)号: US20080231823A1公开(公告)日: 2008-09-25
- 发明人: Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Yasufumi Nishii
- 申请人: Alex Ka Tim Poon , Leonard Wai Fung Kho , Gaurav Keswani , Derek Coon , Yasufumi Nishii
- 申请人地址: JP Tokyo
- 专利权人: NIKON CORPORATION
- 当前专利权人: NIKON CORPORATION
- 当前专利权人地址: JP Tokyo
- 主分类号: G03B27/52
- IPC分类号: G03B27/52
摘要:
A stage assembly includes a workpiece table that supports the workpiece adjacent to an optical assembly. An environmental system supplies and removes immersion liquid to and from a space between the workpiece and the optical assembly to form an immersion area. The environmental system has a lower surface disposed opposite from an upper surface of the workpiece and/or the workpiece table. The lower surface is spaced a first distance from the workpiece and/or the workpiece table to form a meniscus at a periphery of the immersion area. An edge member is provided on the environmental system and extends past the lower surface of the environmental system so that a lower portion of the edge member is spaced a second distance, smaller than the first distance, from the upper surface of the workpiece and/or the workpiece table at a position beyond the periphery of the immersion area.
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