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1.发明申请APPARATUS AND METHOD TO CONTROL LIQUID STAGNATION IN IMMERSION LIQUID RECOVERY 审中-公开用于控制液体液体回收中的液体检测的装置和方法公开(公告)号：US20100220301A1
公开(公告)日：2010-09-02
申请号：US12691173
申请日：2010-01-21
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and a liquid-permeable member. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a chamber. The confinement member includes at least one liquid inlet within the chamber through which a liquid is introduced into the chamber to reduce liquid from becoming stagnated within the chamber.
摘要翻译： 浸没液体限制装置将浸没液体限制在浸没式光刻系统中包括投影系统和曝光对象之间的间隙的浸没区域中。 该设备还从浸没区域中恢复浸没液体。 该装置包括限制构件和液体可渗透构件。 限制构件包括出口和孔，将图案化图像投射到物体上。 液体渗透部件覆盖出口并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触室。 所述限制构件包括在所述腔室内的至少一个液体入口，通过所述至少一个液体入口将液体引入所述腔室中以减少液体停滞在所述腔室内。
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2.发明申请公开(公告)号：US20070091289A1
公开(公告)日：2007-04-26
申请号：US11583069
申请日：2006-10-19
申请人： Alex Poon , Leonard Kho , Gaurav Keswani
发明人： Alex Poon , Leonard Kho , Gaurav Keswani
IPC分类号： G03B27/42
CPC分类号： G03F7/70925 , G03B27/42 , G03F7/70341 , G03F7/70725
摘要： Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.
摘要翻译： 通过移动衬底相对于浸入式喷嘴使基板的剩余部分已经通过浸入式喷嘴的方式残留在衬底的一部分上的浸入流体，使得残留有浸没流体的衬底部分再次被浸入式喷嘴通过。 确定要移动衬底以移除剩余浸没流体的路径。 该路径可以基于先前的基底移动来确定，包括先前移动的速度和/或长度等因素。 或者，可以检测浸入液体残留的基板的部分，然后基于检测结果，移动基板以使浸没流体保留的基板的部分通过浸渍喷嘴。 浸没流体也可以从位于基底之外的载物台表面除去。
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公开(公告)号：US20070046910A1
公开(公告)日：2007-03-01
申请号：US11443361
申请日：2006-05-31
申请人： Alex Poon , Leonard Kho , Gaurav Keswani
发明人： Alex Poon , Leonard Kho , Gaurav Keswani
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A apparatus and methods recover a fluid from an immersion area formed in a gap between a projection system and an object of exposure in an immersion lithography system. A porous member is disposed adjacent to the immersion area. A pressure control system provides a first low pressure to a first portion of the porous member to remove immersion fluid that escapes from the immersion area, and provides a second low pressure to a second portion of the porous member to remove immersion fluid that escapes from the immersion area. The second low pressure is different from the first low pressure.
摘要翻译： 一种设备和方法从浸没式光刻系统中的投影系统和曝光对象之间的间隙中形成的浸没区域中回收流体。 多孔构件邻近浸入区域设置。 压力控制系统向多孔构件的第一部分提供第一低压以去除从浸没区域逸出的浸没流体，并且向多孔构件的第二部分提供第二低压以除去从该多孔构件逸出的浸没流体 沉浸区域。 第二低压与第一低压不同。
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公开(公告)号：US08934080B2
公开(公告)日：2015-01-13
申请号：US13617251
申请日：2012-09-14
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
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5.发明授权公开(公告)号：US08780323B2
公开(公告)日：2014-07-15
申请号：US13064232
申请日：2011-03-11
CPC分类号： G03F7/70925 , G03B27/42 , G03F7/70341 , G03F7/70725
摘要： Immersion fluid remaining on a portion of a substrate after that portion has passed an immersion nozzle is removed by moving the substrate relative to an immersion nozzle so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle again. A path is determined along which the substrate is to be moved to remove the remaining immersion fluid. The path can be determined based upon previous movements of the substrate, including factors such as the speed and/or length of the previous movements. Alternatively, portions of the substrate on which immersion fluid remains can be detected, and then the substrate can be moved so that the portion of the substrate on which the immersion fluid remains is passed by the immersion nozzle based on the results of the detection. Immersion fluid also can be removed from the stage surface located beyond the substrate.
摘要翻译： 通过移动衬底相对于浸入式喷嘴使基板的剩余部分已经通过浸入式喷嘴的方式残留在基板的一部分上的浸入流体，使得残留有浸没流体的基板部分再次被浸入式喷嘴通过。 确定要移动衬底以移除剩余浸没流体的路径。 该路径可以基于先前的基底移动来确定，包括先前移动的速度和/或长度等因素。 或者，可以检测浸入液体残留的基板的部分，然后基于检测结果，移动基板以使浸没流体保留的基板的部分通过浸渍喷嘴。 浸没流体也可以从位于基底之外的载物台表面除去。
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6.发明授权Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine 有权在浸没式光刻机中的晶片更换期间将浸没流体保持在光学组件附近的装置和方法公开(公告)号：US08400610B2
公开(公告)日：2013-03-19
申请号：US13532195
申请日：2012-06-25
申请人： Alex Poon , Leonard Kho , Gaurav Keswani , Derek Coon , Daishi Tanak
发明人： Alex Poon , Leonard Kho , Gaurav Keswani , Derek Coon , Daishi Tanak
CPC分类号： G03F7/70341 , G03F7/70733
摘要： Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.
摘要翻译： 装置和方法将浸没液体保持在与光学组件相邻的空间中。 光学组件通过衬底台将图像投影到靠近光学组件支撑的衬底上。 可插入到光学组件和衬底之间的空间，衬底台或两者中的插入构件将浸没液体分成第一部分和第二部分，第一部分设置在光学组件和插入构件之间， 第二部分设置在插入构件和衬底之间，衬底台或两者。 当基板移动远离邻近光学组件时，插入构件保持光学组件与第一部分接触。
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公开(公告)号：US20090237631A1
公开(公告)日：2009-09-24
申请号：US12379419
申请日：2009-02-20
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
摘要翻译： 浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中， 液体限制构件和液体分配器。 液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。 液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。 液体转向器位于台架和至少第一多孔部分之间。
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8.发明申请Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate 有权浸没式光刻设备和方法，在浸没液体限制构件和衬底之间具有可移动的液体转向器公开(公告)号：US20090231560A1
公开(公告)日：2009-09-17
申请号：US12382100
申请日：2009-03-09
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/52
摘要： An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.
摘要翻译： 浸没光刻设备包括具有最终光学元件的投影系统和可移动到投影系统下方的位置的台架，使得在最终光学元件与台面的表面之间存在间隙。 浸没液体填充表面和最终光学元件之间的间隙。 液体限制构件将浸没液体保持在间隙中。 浸没液体具有弯液面，其中液体接触环境气体，弯月面限定了浸没区域的覆盖区域。 可移动的液体转向器位于液体限制构件和载物台之间。 可移动液体分配器在平行于载物台表面的方向上相对于液体限制构件移动，并且包括围绕浸没区域的开口，当平台静止时，开口接触或与浸没区域稍微间隔开。
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9.发明授权Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid 有权浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中公开(公告)号：US07532309B2
公开(公告)日：2009-05-12
申请号：US11523595
申请日：2006-09-20
IPC分类号： G03B27/54
CPC分类号： G03F7/70341
摘要： A lithography apparatus includes a fluid confinement plate which can completely submerge the imaging surface of a substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of a projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface.
摘要翻译： 光刻设备包括可以完全浸没衬底的成像表面的流体限制板。 在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。 定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。 流体限制板包括面对间隙的第一表面并与基底的成像表面相对。 第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。
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10.发明申请Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool 有权喷嘴有助于减少浸没式光刻工具浸没液体的逸出公开(公告)号：US20080231822A1
公开(公告)日：2008-09-25
申请号：US12073783
申请日：2008-03-10
CPC分类号： G03F7/70341
摘要： An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.
摘要翻译： 浸没式光刻工具，其具有位于浸没元件和基底之间的转向元件，用于改变在最后的光学元件与一侧的浸没元件之间的浸没液体的弯液面的“占地面积”或形状，以及 当基板移动时在另一侧的基板。 该装置包括用于保持具有成像表面的基板和具有最后光学元件的投影光学系统的基板保持器。 投影光学系统通过填充在基板的成像表面和最后一个光学元件之间的间隙中的浸渍液体将图像投影到基板上的目标成像区域上。 浸没元件将浸没液保持在间隙中。 分流器元件位于浸没元件和基底之间。 分流器元件改变浸没液体的弯液面的足迹形状，从而防止或减少从基板和浸没元件之间的空间的泄漏量。
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