-
1.发明授权Apparatus and method to control vacuum at porous material using multiple porous materials 有权使用多孔材料控制多孔材料真空的装置和方法公开(公告)号：US08634055B2
公开(公告)日：2014-01-21
申请号：US12698565
申请日：2010-02-02
CPC分类号： G03B27/52 , G03F7/70341
摘要： An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is projected onto the object. A first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. A second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber. A hydrophobic porous member is provided between the first chamber and a vacuum system that supplies a low pressure to the first chamber.
摘要翻译： 浸没液体限制装置从浸没式光刻系统中的浸没区域中浸没液体从浸没区域中恢复，该浸没区域包括投影系统和曝光对象之间的间隙。 该装置包括限制构件，其包括出口和孔，将图案化图像投射到物体上。 第一透液性构件覆盖出口并且具有面向物体的第一表面和与第一表面相对的第二表面，第二表面接触第一室。 第二透液性构件具有第一和第二相对面的表面，第二透液性构件的第一表面接触第一腔室，第二透液构件的第二表面接触与第一液体可渗透构件不同的第二腔室 房间。 在第一室和向第一室供应低压的真空系统之间提供疏水性多孔构件。
-
公开(公告)号：US08289497B2
公开(公告)日：2012-10-16
申请号：US12379419
申请日：2009-02-20
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
摘要翻译： 浸没式光刻设备包括具有最终光学元件的投影系统，在投影系统下方可移动的可移动平台，使得在最终光学元件与台面的表面之间存在间隙，浸没液体填充在间隙中， 液体限制构件和液体分配器。 液体限制部件将浸没液体保持在间隙中，并且包括面向台面的液体回收部，并从间隙回收液体。 液体回收部分包括施加第一吸力的第一多孔部分和施加小于第一吸力的第二吸力的第二多孔部分，第二部分位于第一部分的外侧。 液体转向器位于台架和至少第一多孔部分之间。
-
3.发明申请MICROCHANNEL-COOLED COILS OF ELECTROMAGNETIC ACTUATORS EXHIBITING REDUCED EDDY-CURRENT DRAG 审中-公开电磁致动器的微通道冷却线圈展示减少的EDDY-CURRENT DRAG公开(公告)号：US20120062866A1
公开(公告)日：2012-03-15
申请号：US13225235
申请日：2011-09-02
申请人： Michael B. Binnard , Scott Coakley , Alex Ka Tim Poon , Masahiro Totsu , Derek Coon , Leonard Wai Fung Kho , Gaurav Keswani , Alexander Cooper , Michel Pharand , Matt Bjork
发明人： Michael B. Binnard , Scott Coakley , Alex Ka Tim Poon , Masahiro Totsu , Derek Coon , Leonard Wai Fung Kho , Gaurav Keswani , Alexander Cooper , Michel Pharand , Matt Bjork
CPC分类号： H02K9/22 , G03F7/70758 , G03F7/70875 , H02K9/19 , H02K41/031 , H02K2201/18
摘要： Electromagnetic actuators are disclosed having at least one actively cooled coil assembly. Exemplary actuators are linear and planar motors of which the cooled coil assembly has a coil having first and second main surfaces. A respective thermally conductive cooling plate is in thermal contact with at least one main surface of the coil. Defined in or on each cooling plate is a coolant passageway that conducts a liquid coolant. A primary pattern of the coolant passageway is coextensive with at least part of the main surface of the coil. The primary pattern can have a secondary pattern through which coolant flows in a manner reducing eddy-current losses. An exemplary secondary pattern is serpentine. An exemplary primary pattern is radial or has a radial aspect, such as an X-shaped pattern. The devices exhibit reduced eddy-current drag.
摘要翻译： 公开了具有至少一个主动冷却的线圈组件的电磁致动器。 示例性致动器是线性和平面电动机，其中冷却的线圈组件具有具有第一和第二主表面的线圈。 相应的导热冷却板与线圈的至少一个主表面热接触。 在每个冷却板中或每个冷却板上定义的是冷却剂通道，其导通液体冷却剂。 冷却剂通道的主要图案与线圈的主表面的至少一部分共同延伸。 初级图案可以具有二次图案，冷却剂通过该图案以减少涡流损耗的方式流动。 示例性的次要图案是蛇纹石。 示例性的主要图案是径向的或具有径向方面，例如X形图案。 该装置表现出减小的涡流阻力。
-
4.发明申请Apparatus and methods for minimizing force variation from immersion liquid in lithography systems 审中-公开用于最小化光刻系统中浸入液体的力变化的装置和方法公开(公告)号：US20080198348A1
公开(公告)日：2008-08-21
申请号：US12068737
申请日：2008-02-11
IPC分类号： G03B27/52
CPC分类号： G03F7/70716 , G03F7/70341
摘要： A lithographic projection apparatus includes an optical assembly that projects an image onto a workpiece, and a containment member disposed adjacent to a lower end of the optical assembly. The containment member has an aperture through which an exposure beam passes from the optical assembly to the workpiece. The lithographic projection apparatus also includes a stage assembly including a workpiece table that supports the workpiece adjacent to the containment member. A space between the containment member and the workpiece is filled with an immersion liquid. The lithographic projection apparatus further includes a liquid collection system that has a recess in the workpiece table that receives immersion liquid that overflows the space between the containment member and the workpiece. At least part of the recess is disposed radially outward of the workpiece. The recess is partially filled with a porous material.
摘要翻译： 光刻投影装置包括将图像投影到工件上的光学组件和邻近光学组件的下端设置的容纳构件。 容纳构件具有孔，曝光光束通过该孔从光学组件通过工件。 平版印刷投影装置还包括台架组件，其包括支撑靠近容纳构件的工件的工件台。 容纳构件和工件之间的空间填充有浸没液体。 光刻投影装置还包括液体收集系统，该液体收集系统在工件台中具有凹部，该凹部接收溢流在容纳构件和工件之间的空间的浸没液体。 凹部的至少一部分设置在工件的径向外侧。 凹部部分地填充有多孔材料。
-
5.发明申请Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid 有权浸渍光刻系统和方法具有浸没流体限制板，用于将待成像的基板浸没在浸没流体中公开(公告)号：US20070279608A1
公开(公告)日：2007-12-06
申请号：US11523595
申请日：2006-09-20
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： A lithography apparatus having a fluid confinement plate, which completely submerges the imaging surface of a substrate, is disclosed. The apparatus includes an imaging element defining an image and a stage configured to support the substrate. A projection optical system is provided to project the image defined by the imaging element onto the imaging surface of the substrate. A gap, filled with immersion fluid, is provided between the imaging surface of the substrate and the last optical element of the projection optical system. The fluid confinement plate, which is positioned within the gap between the last optical element and the substrate, is sufficiently sized so that the imaging surface is completely submerged in the immersion fluid. The fluid confinement plate includes a first surface facing the gap and opposing the imaging surface of the substrate. The first surface includes a droplet control element to control the formation of droplets forming on the first surface. In one embodiment, the droplet control element is a porous surface formed on the first surface. A vacuum is used to pull any excess immersion fluid through the porous region to prevent the formation of droplets. In a second embodiment, the droplet control element is a sloped surface that causes any immersion fluid on the first surface to flow toward to main body of immersion fluid in the gap.
摘要翻译： 公开了一种具有完全浸没衬底的成像表面的流体限制板的光刻设备。 该装置包括限定图像的成像元件和被配置为支撑基板的台。 提供投影光学系统以将由成像元件限定的图像投影到基板的成像表面上。 在基板的成像表面和投影光学系统的最后一个光学元件之间提供填充有浸没流体的间隙。 定位在最后一个光学元件和基底之间的间隙内的流体限制板的尺寸足够大，使得成像表面完全浸没在浸没流体中。 流体限制板包括面对间隙的第一表面并与基底的成像表面相对。 第一表面包括用于控制形成在第一表面上的液滴的液滴控制元件。 在一个实施例中，液滴控制元件是形成在第一表面上的多孔表面。 使用真空来吸引多余的浸渍流体通过多孔区域以防止形成液滴。 在第二实施例中，液滴控制元件是使第一表面上的任何浸没流体朝着间隙中的浸没流体的主体流动的倾斜表面。
-
6.发明申请公开(公告)号：US20070209226A1
公开(公告)日：2007-09-13
申请号：US11373398
申请日：2006-03-09
申请人： Derek Coon
发明人： Derek Coon
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70916
摘要： Embodiments disclosed herein relate to an apparatus for and method of protecting a reticle in a lithography system from particle deposition using thermophoresis, but still allowing a high vacuum area for the photo-optics.
摘要翻译： 本文公开的实施例涉及一种用于保护光刻系统中的掩模版的装置和方法，其不使用热泳法进行颗粒沉积，而是仍允许光学光学的高真空区域。
-
公开(公告)号：US20070115453A1
公开(公告)日：2007-05-24
申请号：US11653835
申请日：2007-01-17
申请人： Derek Coon , Andrew Hazelton
发明人： Derek Coon , Andrew Hazelton
IPC分类号： G03B27/32
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70808
摘要： A pattern formation method includes the steps of forming a resist film on a substrate, performing pattern exposure by selectively irradiating the resist film with exposing light with a liquid provided on the resist film, and forming a resist pattern by developing the resist film after the pattern exposure. An electric field or a magnetic is applied to the liquid in the step of performing pattern exposure.
摘要翻译： 图案形成方法包括以下步骤：在基板上形成抗蚀剂膜，通过用设置在抗蚀剂膜上的液体曝光来选择性地照射抗蚀剂膜，进行图案曝光，以及通过在图案之后显影抗蚀剂膜形成抗蚀剂图案 曝光。 在进行图案曝光的步骤中，对液体施加电场或磁场。
-
公开(公告)号：US20050153424A1
公开(公告)日：2005-07-14
申请号：US10754793
申请日：2004-01-08
申请人： Derek Coon
发明人： Derek Coon
CPC分类号： G03F7/70808 , G03F7/70341
摘要： A fluid supply system (26) for controlling an environment in a gap (246) between an optical assembly (16) and a device (30) includes a fluid source (372) and a fluid barrier (256). The fluid source (372) directs an immersion fluid (248) into the gap (246). The fluid barrier (256) is positioned near the gap (246). Further, the fluid barrier (256) includes a transparent area (598) that is substantially transparent. With this design, a measurement system (22) can direct a light beam (270) through the fluid barrier (256) to monitor the position of the device (30).
摘要翻译： 用于控制光学组件（16）和设备（30）之间的间隙（246）中的环境的流体供应系统（26）包括流体源（372）和流体屏障（256）。 流体源（372）将浸没流体（248）引导到间隙（246）中。 流体屏障（256）位于间隙附近（246）。 此外，流体屏障（256）包括基本透明的透明区域（598）。 通过这种设计，测量系统（22）可以引导光束（270）穿过流体屏障（256）来监测设备（30）的位置。
-
9.发明授权Method and apparatus to compensate for thermal expansion in a lithographic process 失效补偿光刻过程中的热膨胀的方法和装置
公开(公告)号：US5834785A
公开(公告)日：1998-11-10
申请号：US870900
申请日：1997-06-06
申请人： Paul Derek Coon
发明人： Paul Derek Coon
CPC分类号： G03F7/70558 , G03F7/70866 , G03F7/70875 , G03F9/70
摘要： Thermal expansion caused by the absorption of thermal energy from exposure dosages can cause misalignment and other problems in the exposure process. The present invention compensates for this problem by developing scaling and backlash coefficients based on the amount of amount of energy absorbed by the substrate undergoing the exposure process. Scaling and backlash are then compensated for in the alignment map which controls the exposure process. In this fashion, scaling and backlash are accounted for prior to exposure, thus ensuring the proper exposure during the lithography process.
摘要翻译： 由暴露剂量吸收热能引起的热膨胀可能导致曝光过程中的未对准和其他问题。 本发明通过基于经历曝光处理的基板吸收的能量的量开发缩放和反向间隙系数来补偿该问题。 然后在控制曝光过程的对准图中补偿缩放和间隙。 以这种方式，在曝光之前考虑到缩放和间隙，从而确保在光刻工艺期间的适当曝光。
-
10.发明授权Immersion lithography fluid control system using an electric or magnetic field generator 有权使用电场或磁场发生器的浸没光刻流体控制系统公开(公告)号：US08102501B2
公开(公告)日：2012-01-24
申请号：US11878547
申请日：2007-07-25
申请人： Derek Coon , Andrew J Hazelton
发明人： Derek Coon , Andrew J Hazelton
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70808
摘要： An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member, a fluid-supplying device which provides an immersion liquid to the gap, and a field generator which generates a magnetic field or an electric field such that the immersion liquid is subjected to the magnetic or electric field generated by the field generator.
摘要翻译： 浸没式光刻设备包括光学构件，在光学构件和与光学构件相对设置的表面之间限定的间隙，向间隙提供浸没液体的流体供应装置和产生磁场的场发生器， 电场使得浸没液体受到场发生器产生的磁场或电场的影响。
-
-
-
-
-
-
-
-
-
搜索结果
52 条记录 (耗时 0.023 秒)
