发明申请
US20080233301A1 STACKED-FILM-FORMING SYSTEM, SPUTTERING APPARATUS, AND METHOD FOR FORMING STACKED FILM 审中-公开
堆叠成膜系统,溅射装置和形成堆叠膜的方法

STACKED-FILM-FORMING SYSTEM, SPUTTERING APPARATUS, AND METHOD FOR FORMING STACKED FILM
摘要:
According to an aspect of an embodiment, a stacked-film-forming system for forming a stacked film has a first film-forming apparatus including a holder having a frame surrounding the substrate and a holding mechanism for holding the substrate inside the frame so that the major surface of the substrate is vertically oriented, a material emission portion for emitting a material of a first film toward the substrate held in the holder, and a shield being disposed between the holder and the material emission portion and shielding areas except for a portion of the frame from the emitted material. The portion is located at the upper part of the substrate. The stacked-film-forming system has a second film-forming apparatus for forming a second film, on the first film. The second film is made of a material different from the material of the first film.
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