发明申请
US20090033915A1 APC SYSTEM AND MULTIVARIATE MONITORING METHOD FOR PLASMA PROCESS MACHINE
有权
APC系统和等离子体处理机多重监测方法
- 专利标题: APC SYSTEM AND MULTIVARIATE MONITORING METHOD FOR PLASMA PROCESS MACHINE
- 专利标题(中): APC系统和等离子体处理机多重监测方法
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申请号: US12248547申请日: 2008-10-09
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公开(公告)号: US20090033915A1公开(公告)日: 2009-02-05
- 发明人: Tuung Luoh , Sheng-Hui Hsieh , Shing-Ann Luo , Chin-Ta Su , Ta-Hung Yang , Kuang-Chao Chen
- 申请人: Tuung Luoh , Sheng-Hui Hsieh , Shing-Ann Luo , Chin-Ta Su , Ta-Hung Yang , Kuang-Chao Chen
- 申请人地址: TW Hsinchu
- 专利权人: MACRONIX INTERNATIONAL CO., LTD.
- 当前专利权人: MACRONIX INTERNATIONAL CO., LTD.
- 当前专利权人地址: TW Hsinchu
- 优先权: TW95144168 20061129
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; H01L21/3065 ; H01L21/30
摘要:
An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system.