发明申请
- 专利标题: PHOTOMASK MOUNTING/HOUSING DEVICE AND RESIST INSPECTION METHOD AND RESIST INSPECTION APPARATUS USING SAME
- 专利标题(中): 光电安装/外壳装置和电阻检测方法和电阻检测装置
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申请号: US12341208申请日: 2008-12-22
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公开(公告)号: US20090161098A1公开(公告)日: 2009-06-25
- 发明人: YOSHIKAZU KATOU , Takahiro Igeta , Hideyuki Moribe , Ryuji Hasegawa
- 申请人: YOSHIKAZU KATOU , Takahiro Igeta , Hideyuki Moribe , Ryuji Hasegawa
- 优先权: JP2007-330488 20071221
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; B32B1/00
摘要:
A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion with a shape allowing the reticle to be inserted into the plate member. Another hollowed portion having a shape being slightly larger than that of the resist of the reticle is formed on the plate member. In the circumference of the hollowed portion is placed a pellicle frame on which a protective film is formed in a stretched manner. In the concave portion is housed in the reticle with a resist on the reticle directed toward the hollowed portion. The reticle is put in sealed space.
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