- 专利标题: Laser produced plasma EUV light source
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申请号: US12655987申请日: 2010-01-11
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公开(公告)号: US20100127186A1公开(公告)日: 2010-05-27
- 发明人: Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
- 申请人: Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
- 申请人地址: US CA San Diego
- 专利权人: Cymer, Inc.
- 当前专利权人: Cymer, Inc.
- 当前专利权人地址: US CA San Diego
- 主分类号: G21K5/00
- IPC分类号: G21K5/00 ; G21K1/06
摘要:
A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
公开/授权文献
- US08035092B2 Laser produced plasma EUV light source 公开/授权日:2011-10-11