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公开(公告)号：US20100127186A1
公开(公告)日：2010-05-27
申请号：US12655987
申请日：2010-01-11
申请人： Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
发明人： Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
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公开(公告)号：US07671349B2
公开(公告)日：2010-03-02
申请号：US11786145
申请日：2007-04-10
申请人： Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
发明人： Alexander N. Bykanov , Norbert Bowering , Igor V. Fomenkov , David C. Brandt , Alexander I. Ershov , Oleh Khodykin , William N. Partlo
IPC分类号： H04H1/04
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译： 公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。 该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预先选定的值以下。 在一个实施方案中，气体可以包含氢气，并且在一个具体实施方案中，气体可以包含大于50体积％的氢气。
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3.发明授权Systems and methods for target material delivery in a laser produced plasma EUV light source 有权用于激光产生等离子体EUV光源的靶材料输送的系统和方法公开(公告)号：US07872245B2
公开(公告)日：2011-01-18
申请号：US12214736
申请日：2008-06-19
申请人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译： 本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。 光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。 该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。
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4.发明申请公开(公告)号：US20090057567A1
公开(公告)日：2009-03-05
申请号：US11897644
申请日：2007-08-31
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译： 本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如， 激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。 对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。 可以提供泵以迫使气体通过闭环流动路径。 可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。 在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。
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5.发明授权公开(公告)号：US08198615B2
公开(公告)日：2012-06-12
申请号：US12658133
申请日：2010-02-02
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译： 本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如， 激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。 对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。 可以提供泵以迫使气体通过闭环流动路径。 可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。 在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。
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6.发明申请公开(公告)号：US20100140514A1
公开(公告)日：2010-06-10
申请号：US12658133
申请日：2010-02-02
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
摘要翻译： 本文描述了装置和相应的使用方法，其可以包括限定闭环流动路径的封闭结构和在等离子体位置处产生等离子体的系统，例如， 激光产生的等离子体系统，其中等离子体位置可以与流动路径流体连通。 对于该装置，气体可以设置在封闭结构中，其可以包括离子停止缓冲气体和/或蚀刻剂。 可以提供泵以迫使气体通过闭环流动路径。 可以提供一种或多种热交换器来从流动路径中流动的气体中除去热量。 在一些布置中，可以使用过滤器来从在流动路径中流动的气体中去除至少一部分目标物种。
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公开(公告)号：US07655925B2
公开(公告)日：2010-02-02
申请号：US11897644
申请日：2007-08-31
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70175 , G03F7/70916 , H05G2/005 , H05G2/008 , Y10S422/906
摘要： Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.
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8.发明申请Systems and methods for target material delivery in a laser produced plasma EUV light source 有权用于激光产生等离子体EUV光源的靶材料输送的系统和方法公开(公告)号：US20090230326A1
公开(公告)日：2009-09-17
申请号：US12214736
申请日：2008-06-19
申请人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
发明人： Georgiy O. Vaschenko , Alexander N. Bykanov , Norbert R. Bowering , David C. Brandt , Alexander I. Ershov , Rodney D. Simmons , Oleh V. Khodykin , Igor V. Fomenkov
IPC分类号： G21K5/00
摘要： Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.
摘要翻译： 本文公开的装置可以包括具有限定旋转轴线和圆形周边的旋转表面的EUV反射光学元件。 光学元件可以被定位成相对于水平面以非零角度倾斜轴，并且在水平面中建立周边的垂直投影，其中周边突起界定水平面中的一个区域。 该装置还可以包括传送目标材料的系统，该系统具有位于水平面内的区域外的外围突起的边界材料释放点和产生用于照射目标材料产生的激光束的系统 EUV排放。
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9.发明授权System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus 有权系统管理极紫外（EUV）光刻设备的腔室之间的气流公开(公告)号：US07812329B2
公开(公告)日：2010-10-12
申请号：US12002073
申请日：2007-12-14
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70808 , G03F7/70841 , G03F7/70908 , G03F7/70916
摘要： A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.
摘要翻译： 气体流量管理系统可以包括至少部分地围绕第一和第二相应空间的第一和第二封闭壁; 在第一空间中产生等离子体的系统，等离子体发射极紫外光; 限制从第一空间流到第二空间的细长体，所述主体至少部分地围绕通道并且具有允许EUV光从第一空间进入通道的第一开口端，以及允许EUV光从第二空间退出的第二开口端 通道进入第二空间，身体形状以建立相对于第一和第二端具有减小的横截面面积的位置; 以及离开孔的气流，所述孔定位成在主体的第一端和具有减小的横截面积的位置之间的位置处将气体引入通道。
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10.发明申请System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus 有权系统管理极紫外（EUV）光刻设备的腔室之间的气流公开(公告)号：US20090154642A1
公开(公告)日：2009-06-18
申请号：US12002073
申请日：2007-12-14
IPC分类号： G21K5/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70808 , G03F7/70841 , G03F7/70908 , G03F7/70916
摘要： A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.
摘要翻译： 气体流量管理系统可以包括至少部分地围绕第一和第二相应空间的第一和第二封闭壁; 在第一空间中产生等离子体的系统，等离子体发射极紫外光; 限制从第一空间流到第二空间的细长体，所述主体至少部分地围绕通道并且具有允许EUV光从第一空间进入通道的第一开口端，以及允许EUV光从第二空间退出的第二开口端 通道进入第二空间，身体形状以建立相对于第一和第二端具有减小的横截面面积的位置; 以及离开孔的气流，所述孔定位成在主体的第一端和具有减小的横截面积的位置之间的位置处将气体引入通道。
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