发明申请
- 专利标题： POLISHING PAD WITH PROJECTING PORTION
- 专利标题（中）： 抛光垫与投影部分
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申请号： US12823872申请日： 2010-06-25
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公开(公告)号： US20100267318A1公开(公告)日： 2010-10-21
- 发明人: Alain Duboust , Shou-Sung Chang , Wei Lu , Siew Neo , Yan Wang , Antoine P. Manens , Yongsik Moon
- 申请人： Alain Duboust , Shou-Sung Chang , Wei Lu , Siew Neo , Yan Wang , Antoine P. Manens , Yongsik Moon
- 主分类号： B24D11/02
- IPC分类号： B24D11/02
摘要：
A polishing pad include a polishing layer having a polishing surface and a backing layer on a side of the polishing layer opposite the polishing surface. An outer edge of the polishing layer overhangs an outer edge of the backing layer.
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