发明申请
- 专利标题： SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM STORING COMPUTER PROGRAM FOR PERFORMING SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING APPARATUS
- 专利标题（中）： 基板处理方法，用于执行基板处理方法的存储介质存储计算机程序和基板处理装置
-
申请号： US13161714申请日： 2011-06-16
-
公开(公告)号： US20110308549A1公开(公告)日： 2011-12-22
- 发明人: Teruomi MINAMI , Naoyuki Okamura , Hirotaka Maruyama , Yosuke Kawabuchi
- 申请人： Teruomi MINAMI , Naoyuki Okamura , Hirotaka Maruyama , Yosuke Kawabuchi
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-138484 20100617
- 主分类号： B08B3/08
- IPC分类号： B08B3/08 ; B08B7/04
摘要：
In a substrate processing method according to the present invention, a substrate is first processed using a chemical liquid. Next, the substrate is rinsed by supplying a rinsing liquid thereto while the substrate is being rotated. Thereafter, the substrate is dried while the substrate is being rotated. The drying of the substrate includes reducing a rotating speed of the substrate to a first rotating speed lower than that of the substrate during the rinsing of the substrate, while supplying the rinsing liquid to a central portion of the substrate; moving, from the central portion of the substrate toward a peripheral edge portion thereof, a rinsing liquid supply position to which the rinsing liquid is supplied, after the rotating speed of the substrate has been reduced to the first rotating speed; and supplying a drying liquid to the substrate, after the rinsing liquid supply position has been moved.