发明申请
- 专利标题: HEAT-RADIATING SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
- 专利标题(中): 加热基板及其制造方法
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申请号: US13013736申请日: 2011-01-25
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公开(公告)号: US20120111610A1公开(公告)日: 2012-05-10
- 发明人: Kwang Soo KIM , Sang Hyun SHIN , Jung Eun KANG , Chang Hyun LIM , Seog Moon CHOI , Sung Keun PARK
- 申请人: Kwang Soo KIM , Sang Hyun SHIN , Jung Eun KANG , Chang Hyun LIM , Seog Moon CHOI , Sung Keun PARK
- 申请人地址: KR Gyunggi-do
- 专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 当前专利权人地址: KR Gyunggi-do
- 优先权: KR10-2010-0109984 20101105
- 主分类号: H05K1/02
- IPC分类号: H05K1/02 ; C23C28/00
摘要:
Disclosed herein are a heat-radiating substrate and a method for manufacturing the same. The heat-radiating substrate includes: an anodized substrate having an anodized film formed over a metal substrate; a circuit pattern formed on one surface of the anodized substrate; and a metal layer formed on the other surface of the anodized substrate. The metal layer formed on the other surface of the anodized substrate has the same area as that of the circuit pattern formed on one surface thereof, and is formed within an edge of the anodized substrate. The metal layer is added, making it possible to minimize a warpage problem of the substrate. In addition, a heat radiating plate is in direct contact with the anodized substrate, thereby making it possible to solve a performance deterioration problem of the heat-radiating substrate and a heat generating element and improve a heat-radiating performance.
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