发明申请
- 专利标题： METHOD EXTENDING THE SERVICE INTERVAL OF A GAS DISTRIBUTION PLATE
- 专利标题（中）： 方法扩展气体分配板的服务间隔
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申请号： US13408709申请日： 2012-02-29
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公开(公告)号： US20120222752A1公开(公告)日： 2012-09-06
- 发明人: Adauto Diaz , Andrew Nguyen , Benjamin Schwarz , Eu Jin Lim , Jared Ahmad Lee , James P. Cruse , Li Zhang , Scott M. Williams , Xiaoliang Zhuang , Zhuang Li
- 申请人： Adauto Diaz , Andrew Nguyen , Benjamin Schwarz , Eu Jin Lim , Jared Ahmad Lee , James P. Cruse , Li Zhang , Scott M. Williams , Xiaoliang Zhuang , Zhuang Li
- 申请人地址： US CA Santa Clara
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： B08B5/00
- IPC分类号： B08B5/00
摘要：
Methods for reducing the contamination of a gas distribution plate are provided. In one embodiment, a method for processing a substrate includes transferring the substrate into a chamber, performing a treating process on the substrate, and providing a purge gas into the chamber before or after the treating process to pump out a residue gas relative to the treating process from the chamber. The treating process includes distributing a reactant gas into the chamber through a gas distribution plate.