Invention Application
- Patent Title: SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER
- Patent Title (中): 基板支架，光刻装置，装置制造方法及制造基板支架的方法
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Application No.: US13455870Application Date: 2012-04-25
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Publication No.: US20120274920A1Publication Date: 2012-11-01
- Inventor: Jan BEX , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade
- Applicant: Jan BEX , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03B27/58
- IPC: G03B27/58 ; B05D3/00 ; B05D5/12
Abstract:
A method of manufacturing a substrate holder for use in a lithographic apparatus, the method including providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, providing a carrier surface adjacent the main body surface, and forming a conductive layer on at least part of the main body surface and an integral part on at least part of the carrier surface.
Public/Granted literature
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