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1.发明授权Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder 有权基片支架，光刻设备，器件制造方法以及衬底保持器的制造方法公开(公告)号：US09354528B2
公开(公告)日：2016-05-31
申请号：US13455870
申请日：2012-04-25
申请人： Jan Bex , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade
发明人： Jan Bex , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade
CPC分类号： G03F7/70708 , G03F7/70716 , G03F7/7085 , G03F7/70875
摘要： A method of manufacturing a substrate holder for use in a lithographic apparatus, the method including providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, providing a carrier surface adjacent the main body surface, and forming a conductive layer on at least part of the main body surface and an integral part on at least part of the carrier surface.
摘要翻译： 一种制造用于光刻设备的衬底保持器的方法，所述方法包括提供具有表面的主体和从所述表面突出的多个毛刺，并且具有端面以支撑衬底，提供邻近所述主体的载体表面 表面，并且在主体表面的至少一部分上形成导电层，并在载体表面的至少一部分上形成整体部分。
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2.发明申请SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER 有权基板支架，光刻装置，装置制造方法及制造基板支架的方法公开(公告)号：US20120274920A1
公开(公告)日：2012-11-01
申请号：US13455870
申请日：2012-04-25
申请人： Jan BEX , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade
发明人： Jan BEX , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Johannes Wilhelmus Damen , Eugene Maria Brinkhof , Yogesh Pramod Karade
CPC分类号： G03F7/70708 , G03F7/70716 , G03F7/7085 , G03F7/70875
摘要： A method of manufacturing a substrate holder for use in a lithographic apparatus, the method including providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, providing a carrier surface adjacent the main body surface, and forming a conductive layer on at least part of the main body surface and an integral part on at least part of the carrier surface.
摘要翻译： 一种制造用于光刻设备的衬底保持器的方法，所述方法包括提供具有表面的主体和从所述表面突出的多个毛刺，并且具有端面以支撑衬底，提供邻近所述主体的载体表面 表面，并且在主体表面的至少一部分上形成导电层，并在载体表面的至少一部分上形成整体部分。
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3.发明授权Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder 有权基片支架，光刻设备，器件制造方法以及衬底保持器的制造方法公开(公告)号：US09423699B2
公开(公告)日：2016-08-23
申请号：US13323520
申请日：2011-12-12
申请人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
发明人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade
CPC分类号： G03F7/70716 , C23C16/44 , G03F7/70341 , G03F7/707 , G03F7/70975 , H01L21/6875 , Y10T29/49
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.
摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层提供用于形成诸如薄膜电子部件的电子部件的光滑表面。 平坦化层可以设置在多个子层中。 平坦化层可以平滑超过由坯料去除材料而形成的粗糙度，以在衬底保持器上形成毛刺。
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4.发明公开公开(公告)号：US20230251579A1
公开(公告)日：2023-08-10
申请号：US18299534
申请日：2023-04-12
申请人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
发明人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
IPC分类号： G03F7/00 , B23K26/354 , B23K26/342 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , B05D3/06 , B05D5/00 , B33Y10/00 , B33Y80/00 , B22F7/06
CPC分类号： G03F7/70341 , B23K26/354 , B23K26/342 , G03F7/70416 , G03F7/707 , G03F7/70708 , B22F10/00 , B22F10/20 , B23Q3/18 , G03F7/20 , G03F7/70716 , B05D3/06 , B05D5/00 , G03F7/70733 , B33Y10/00 , B33Y80/00 , B22F7/062 , G03F7/708 , B22F10/25
摘要： A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
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公开(公告)号：US20150029485A1
公开(公告)日：2015-01-29
申请号：US14373291
申请日：2013-01-17
申请人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
发明人： Raymond Wilhelmus Louis Lafarre , Sjoerd Nicolaas Lambertus Donders , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Elisabeth Corinne Rodenburg
CPC分类号： B22F7/062 , B05D3/06 , B05D5/00 , B22F3/1055 , B23K26/342 , B23K26/354 , B23Q3/18 , B33Y10/00 , B33Y80/00 , G03F7/20 , G03F7/70341 , G03F7/70416 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/70733 , G03F7/708
摘要： An object holder (100) for a lithographic apparatus has a main body (400) having a surface (400a). A plurality of burls (406) to support an object are formed on the surface or in apertures of a thin-film stack (410, 440, 450). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
摘要翻译： 用于光刻设备的物体保持器（100）具有具有表面（400a）的主体（400）。 在薄膜堆叠（410,440,450）的表面上或孔中形成有用于支撑物体的多个毛刺（406）。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损伤的隆起的修复或其他方法。
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6.发明授权Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder 有权基片支架，光刻设备，器件制造方法以及衬底保持器的制造方法公开(公告)号：US09256139B2
公开(公告)日：2016-02-09
申请号：US13398582
申请日：2012-02-16
申请人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Siegfried Alexander Tromp , Jacobus Josephus Leijssen , Elisabeth Corinne Rodenburg , Maurice Wilhelmus Leonardus Hendricus Feijts , Hendrik Huisman
发明人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Nina Vladimirovna Dziomkina , Yogesh Pramod Karade , Siegfried Alexander Tromp , Jacobus Josephus Leijssen , Elisabeth Corinne Rodenburg , Maurice Wilhelmus Leonardus Hendricus Feijts , Hendrik Huisman
CPC分类号： G03F7/70716 , B05D3/02 , G01J5/0285 , G01J5/20 , G03F7/70341 , G03F7/70708
摘要： A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.
摘要翻译： 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 薄膜堆叠包括（可选）隔离层，形成电极的金属层，传感器，加热器，晶体管或逻辑器件以及顶部隔离层。
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7.发明授权Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method 有权用于光刻设备的基板，光刻设备，使用基板台的方法和器件制造方法公开(公告)号：US08941815B2
公开(公告)日：2015-01-27
申请号：US12821015
申请日：2010-06-22
申请人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
发明人： Raymond Wilhelmus Louis Lafarre , Jozef Petrus Henricus Benschop , Nicolaas Ten Kate , Niek Jacobus Johannes Roset , Gerardus Adrianus Antonius Maria Kusters , Alexander Nikolov Zdravkov , Hrishikesh Patel , Sander Van Opstal
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/707 , G03F7/70808
摘要： A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.
摘要翻译： 为浸没式光刻设备中的衬底台设置盖子，该衬底台至少覆盖衬底和接收衬底的衬底台中的凹部之间的间隙。
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公开(公告)号：US08553206B2
公开(公告)日：2013-10-08
申请号：US12881878
申请日：2010-09-14
申请人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns
发明人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns
CPC分类号： G03F7/70758 , G03F7/70341
摘要： A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.
摘要翻译： 一种光刻设备，包括被配置为保持基板的基板台; 定位器，其被配置为相对于投影系统定位所述基板台，所述定位器包括被配置为执行精细定位运动的短行程模块，所述基准台被保持在所述定位运动上，并且所述定位器被支撑在构造成执行粗略定位运动的长行程模块 ; 以及盖板，其构造成至少部分地覆盖所述短行程模块的顶表面; 其中所述盖板安装到所述长冲程模块。
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公开(公告)号：US08659742B2
公开(公告)日：2014-02-25
申请号：US12969635
申请日：2010-12-16
申请人： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Alexander Nikolov Zdravkov
发明人： Niek Jacobus Johannes Roset , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Alexander Nikolov Zdravkov
CPC分类号： G03F7/70716 , G03F7/70341
摘要： An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which includes, in cross-section, a feature, and has an adjustment fluid source configured to locally change the composition of the immersion liquid to cause a local decrease in surface tension of the immersion liquid at least when a meniscus of the immersion liquid contacts the feature.
摘要翻译： 公开了一种浸没式光刻设备，其具有流体处理系统，该流体处理系统构造成在投影系统的最终元件和包括横截面的特征之间提供浸没液体，并且具有调节流体源，该调整流体源被配置为局部地改变 至少当浸没液体的弯月面接触该特征时，浸没液的组成导致浸液的表面张力局部降低。
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公开(公告)号：US08405819B2
公开(公告)日：2013-03-26
申请号：US12775045
申请日：2010-05-06
申请人： Laurentius Johannes Adrianus Van Bokhoven , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Henricus Jozef Castelijns , Petrus Martinus Gerardus Johannes Arts
发明人： Laurentius Johannes Adrianus Van Bokhoven , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Henricus Jozef Castelijns , Petrus Martinus Gerardus Johannes Arts
CPC分类号： G03F7/70716 , G03F7/70341
摘要： In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.
摘要翻译： 在全湿式浸没式光刻设备中，允许浸没液体从衬底台的边缘流出。 在曝光期间，浸没液体与衬底台一起移动。 浸没液体的运动可能导致干扰和/或脱湿。 提出了可以减少这种干扰和/或去湿的衬底台的几何形状。 考虑衬底台的横截面边缘轮廓和/或衬底台的平面形状。
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