发明申请
- 专利标题: Sputter Gun
- 专利标题(中): 溅射枪
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申请号: US13721419申请日: 2012-12-20
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公开(公告)号: US20140174918A1公开(公告)日: 2014-06-26
- 发明人: Hong Sheng Yang , Kent Riley Child , Chi-I Lang , Jingang Su , Danny Wang
- 申请人: INTERMOLECULAR, INC.
- 申请人地址: US CA San Jose
- 专利权人: Intermolecular, Inc.
- 当前专利权人: Intermolecular, Inc.
- 当前专利权人地址: US CA San Jose
- 主分类号: C23C14/35
- IPC分类号: C23C14/35
摘要:
A sputter gun is provided. The sputter gun includes a target and a first plate coupled to a surface of the target. A first magnet is disposed over a second magnet. A second plate coupled to a surface of the first magnet and a gap is defined between a surface of the second magnet and a surface of the first plate. A fluid inlet and a fluid outlet are disposed above a surface of the first magnet. A restriction bar is coupled to the second plate, wherein the restriction bar is configured to prevent a flow path of fluid through the first inlet to the second inlet unless the fluid traverses the gap defined between a surface of the second magnet and a surface of the first plate. Alternative configurations of the sputter gun are included.
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