Invention Application
US20150380263A1 CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING ONE OR MORE POLYMERS SELECTED FROM THE GROUP CONSISTING OF N-VINYL-HOMOPOLYMERS AND N-VINYL COPOLYMERS
审中-公开
化学机械抛光组合物包含从包含N-乙烯基共聚物和N-乙烯基共聚物的组中选择的一种或多种聚合物
- Patent Title: CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING ONE OR MORE POLYMERS SELECTED FROM THE GROUP CONSISTING OF N-VINYL-HOMOPOLYMERS AND N-VINYL COPOLYMERS
- Patent Title (中): 化学机械抛光组合物包含从包含N-乙烯基共聚物和N-乙烯基共聚物的组中选择的一种或多种聚合物
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Application No.: US14768825Application Date: 2014-05-05
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Publication No.: US20150380263A1Publication Date: 2015-12-31
- Inventor: Yongqing LAN , Peter PRZYBYLSKI , Zhenyu BAO , Julian PROELSS
- Applicant: BASF SE
- Applicant Address: DE Ludwigshafen
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen
- Priority: EP13167872.4 20130515
- International Application: PCT/IB2014/061200 WO 20140505
- Main IPC: H01L21/306
- IPC: H01L21/306 ; C09G1/02
Abstract:
Described is a chemical-mechanical polishing (CMP) composition comprising the following components: (A) surface modified silica particles having a negative zeta potential of −15 mV or below at a pH in the range of from 2 to 6 (B) one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers (C) water (D) optionally one or more further constituents, wherein the pH of the composition is in the range of from 2 to 6.
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