Invention Grant
- Patent Title: Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers
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Application No.: US14768825Application Date: 2014-05-05
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Publication No.: US10090159B2Publication Date: 2018-10-02
- Inventor: Yongqing Lan , Peter Przybylski , Zhenyu Bao , Julian Proelss
- Applicant: BASF SE
- Applicant Address: DE Ludwigshafen
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: EP13167872 20130515
- International Application: PCT/IB2014/061200 WO 20140505
- International Announcement: WO2014/184702 WO 20141120
- Main IPC: C09K13/06
- IPC: C09K13/06 ; H01L21/306 ; C09G1/02 ; C09K3/14 ; H01L21/321
Abstract:
Described is a chemical-mechanical polishing (CMP) composition comprising the following components: (A) surface modified silica particles having a negative zeta potential of −15 mV or below at a pH in the range of from 2 to 6 (B) one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymers (C) water (D) optionally one or more further constituents, wherein the pH of the composition is in the range of from 2 to 6.
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