- 专利标题： INDUCTIVELY-COUPLED PLASMA ION SOURCE FOR USE WITH A FOCUSED ION BEAM COLUMN WITH SELECTABLE IONS
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申请号： US14804148申请日： 2015-07-20
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公开(公告)号： US20160027607A1公开(公告)日： 2016-01-28
- 发明人: Anthony Graupera , Charles Otis
- 申请人： FEI Company
- 申请人地址： US OR Hillsboro
- 专利权人： FEI Company
- 当前专利权人： FEI Company
- 当前专利权人地址： US OR Hillsboro
- 主分类号： H01J37/05
- IPC分类号： H01J37/05 ; H01J37/317 ; H01J37/08
摘要：
An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.
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