Invention Application
US20160064275A1 Selective Deposition With Alcohol Selective Reduction And Protection
审中-公开
选择性沉积与酒精选择性还原和保护
- Patent Title: Selective Deposition With Alcohol Selective Reduction And Protection
- Patent Title (中): 选择性沉积与酒精选择性还原和保护
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Application No.: US14469980Application Date: 2014-08-27
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Publication No.: US20160064275A1Publication Date: 2016-03-03
- Inventor: Feng Q. Liu , Paul F. Ma , Hua Ai , Jiang Lu , Mei Chang , David Thompson
- Applicant: Applied Materials, Inc.
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/311
Abstract:
Methods of selectively depositing a metal selectively onto a metal surface relative to a dielectric surface. Methods include reducing a metal oxide surface to a metal surface and protecting a dielectric surface to minimize deposition thereon.
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