Invention Application
- Patent Title: 183NM Laser And Inspection System
- Patent Title (中): 183NM激光检测系统
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Application No.: US14872890Application Date: 2015-10-01
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Publication No.: US20160099540A1Publication Date: 2016-04-07
- Inventor: Yung-Ho Alex Chuang , J. Joseph Armstrong , Yujun Deng , Vladimir Dribinski , John Fielden , Jidong Zhang
- Applicant: KLA-Tencor Corporation
- Main IPC: H01S3/109
- IPC: H01S3/109 ; H01S3/108 ; H01S5/40 ; G01N21/88 ; H01S5/00 ; G02B21/10 ; G02B21/16 ; G02B21/36 ; H01S3/10 ; H01S5/06

Abstract:
A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal.
Public/Granted literature
- US09748729B2 183NM laser and inspection system Public/Granted day:2017-08-29
Information query
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