- 专利标题: ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF, AND DISPLAY DEVICE
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申请号: US14574721申请日: 2014-12-18
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公开(公告)号: US20160148838A1公开(公告)日: 2016-05-26
- 发明人: Shi SHU , Feng ZHANG , Yaohui GU , Fang HE , Feng GU
- 申请人: BOE TECHNOLOGY GROUP CO., LTD.
- 优先权: CN201410697709.1 20141126
- 主分类号: H01L21/768
- IPC分类号: H01L21/768 ; G02F1/1362 ; G02F1/1368 ; H01L27/12
摘要:
Embodiments of the disclosure disclose an array substrate and a fabrication method thereof, and a display device. The fabrication method of the array substrate comprises: forming a thin film transistor; forming a passivation layer covering the thin film transistor, the passivation layer having a via hole and the via hole exposing at least a portion of a drain electrode of the thin film transistor; forming a via-hole conductive layer, the via-hole conductive layer covering the portion of the drain electrode exposed at the via hole and connected to the drain electrode; treating the via-hole conductive layer, so that a reflectivity of the via-hole conductive layer is lower than a reflectivity of the drain electrode; and forming a pixel electrode, the pixel electrode being connected with the drain electrode through the via-hole conductive layer.
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