发明申请
- 专利标题: DEVELOPING TREATMENT APPARATUS AND DEVELOPING TREATMENT METHOD
- 专利标题(中): 开发治疗设备和开发治疗方法
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申请号: US15051780申请日: 2016-02-24
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公开(公告)号: US20160202609A1公开(公告)日: 2016-07-14
- 发明人: Yasushi TAKIGUCHI , Taro YAMAMOTO , Yoshinori IKEDA , Koki YOSHIMURA , Yoshiki OKAMOTO , Masahiro FUKUDA
- 申请人: Tokyo Electron Limited
- 优先权: JP2012-201117 20120913; JP2013-162536 20130805
- 主分类号: G03F7/16
- IPC分类号: G03F7/16
摘要:
The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.
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