Invention Application
US20160282271A1 Method for the Optical Characterization of an Optoelectronic Semiconductor Material and Device for Carrying Out the Method 审中-公开
用于光电半导体材料的光学表征的方法和用于实施该方法的装置

  • Patent Title: Method for the Optical Characterization of an Optoelectronic Semiconductor Material and Device for Carrying Out the Method
  • Patent Title (中): 用于光电半导体材料的光学表征的方法和用于实施该方法的装置
  • Application No.: US15030553
    Application Date: 2014-11-14
  • Publication No.: US20160282271A1
    Publication Date: 2016-09-29
  • Inventor: Jens EBBECKESiegmar KUGLERTobias MEYERMatthias PETER
  • Applicant: OSRAM OPTO SEMICONDUCTORS GMBH
  • Priority: DE102013112885.8 20131121
  • International Application: PCT/EP2014/074655 WO 20141114
  • Main IPC: G01N21/64
  • IPC: G01N21/64 G01N21/88 G01N21/95
Method for the Optical Characterization of an Optoelectronic Semiconductor Material and Device for Carrying Out the Method
Abstract:
A method is provided for a full-area optical characterization of an optoelectronic semiconductor material which is provided for producing a plurality of optoelectronic semiconductor chips and which has a band gap which specifies a characteristic wavelength of the semiconductor material. The method includes full-area irradiating a major surface of the optoelectronic semiconductor material with light having an excitation wavelength which is less than the characteristic wavelength of the semiconductor material, with the full-area irradiating generating electron-hole pairs in the semiconductor material. The method further includes full-area detecting a recombination radiation having the characteristic wavelength which is emitted as a result of recombination of the electron-hole pairs from the major surface of the semiconductor material. A device for carrying out the method is also provided.
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