Invention Application
US20160282271A1 Method for the Optical Characterization of an Optoelectronic Semiconductor Material and Device for Carrying Out the Method
审中-公开
用于光电半导体材料的光学表征的方法和用于实施该方法的装置
- Patent Title: Method for the Optical Characterization of an Optoelectronic Semiconductor Material and Device for Carrying Out the Method
- Patent Title (中): 用于光电半导体材料的光学表征的方法和用于实施该方法的装置
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Application No.: US15030553Application Date: 2014-11-14
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Publication No.: US20160282271A1Publication Date: 2016-09-29
- Inventor: Jens EBBECKE , Siegmar KUGLER , Tobias MEYER , Matthias PETER
- Applicant: OSRAM OPTO SEMICONDUCTORS GMBH
- Priority: DE102013112885.8 20131121
- International Application: PCT/EP2014/074655 WO 20141114
- Main IPC: G01N21/64
- IPC: G01N21/64 ; G01N21/88 ; G01N21/95

Abstract:
A method is provided for a full-area optical characterization of an optoelectronic semiconductor material which is provided for producing a plurality of optoelectronic semiconductor chips and which has a band gap which specifies a characteristic wavelength of the semiconductor material. The method includes full-area irradiating a major surface of the optoelectronic semiconductor material with light having an excitation wavelength which is less than the characteristic wavelength of the semiconductor material, with the full-area irradiating generating electron-hole pairs in the semiconductor material. The method further includes full-area detecting a recombination radiation having the characteristic wavelength which is emitted as a result of recombination of the electron-hole pairs from the major surface of the semiconductor material. A device for carrying out the method is also provided.
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