Invention Application
- Patent Title: MODULATION OF MAGNETIC PROPERTIES THROUGH IMPLANTATION AND ASSOCIATED STRUCTURES
- Patent Title (中): 通过植入和相关结构调制磁性
-
Application No.: US15122129Application Date: 2014-03-28
-
Publication No.: US20170005136A1Publication Date: 2017-01-05
- Inventor: Christopher J. WIEGAND , Md Tofizur RAHMAN , Oleg GOLONZKA , Anant H. JAHAGIRDAR , Mengcheng LU
- Applicant: Intel Corporation
- International Application: PCT/US2014/032240 WO 20140328
- Main IPC: H01L27/22
- IPC: H01L27/22 ; G11C11/16 ; H01L43/02 ; H01L43/08 ; H01L43/12 ; H01L43/10

Abstract:
Embodiments of the present disclosure describe techniques and configurations associated with modulation of magnetic properties through implantation. In one embodiment, a method includes providing a substrate having an integrated circuit (IC) structure disposed on the substrate, the IC structure including a magnetizable material, implanting at least a portion of the magnetizable material with a dopant and magnetizing the magnetizable material, wherein said magnetizing is inhibited in the implanted portion of the magnetizable material. Other embodiments may be described and/or claimed.
Public/Granted literature
- US10079266B2 Modulation of magnetic properties through implantation and associated structures Public/Granted day:2018-09-18
Information query
IPC分类: