Invention Grant
- Patent Title: Modulation of magnetic properties through implantation and associated structures
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Application No.: US15122129Application Date: 2014-03-28
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Publication No.: US10079266B2Publication Date: 2018-09-18
- Inventor: Christopher J. Wiegand , Md Tofizur Rahman , Oleg Golonzka , Anant H. Jahagirdar , Mengcheng Lu
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- International Application: PCT/US2014/032240 WO 20140328
- International Announcement: WO2015/147875 WO 20151001
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/12 ; G11C11/16 ; H01L43/02 ; H01L43/08 ; H01L43/10

Abstract:
Embodiments of the present disclosure describe techniques and configurations associated with modulation of magnetic properties through implantation. In one embodiment, a method includes providing a substrate having an integrated circuit (IC) structure disposed on the substrate, the IC structure including a magnetizable material, implanting at least a portion of the magnetizable material with a dopant and magnetizing the magnetizable material, wherein said magnetizing is inhibited in the implanted portion of the magnetizable material. Other embodiments may be described and/or claimed.
Public/Granted literature
- US20170005136A1 MODULATION OF MAGNETIC PROPERTIES THROUGH IMPLANTATION AND ASSOCIATED STRUCTURES Public/Granted day:2017-01-05
Information query
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