Invention Application
- Patent Title: EBEAM NON-UNIVERSAL CUTTER
- Patent Title (中): EBEAM非通用切割机
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Application No.: US15122403Application Date: 2014-12-19
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Publication No.: US20170069461A1Publication Date: 2017-03-09
- Inventor: Yan A. BORODOVSKY , Donald W. NELSON , Mark C. PHILLIPS
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- International Application: PCT/US14/71668 WO 20141219
- Main IPC: H01J37/30
- IPC: H01J37/30 ; H01J37/147 ; H01J37/317 ; H01J37/06 ; H01L21/027 ; G03F7/20
Abstract:
Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA is a non-universal cutter.
Public/Granted literature
- US09952511B2 Ebeam non-universal cutter Public/Granted day:2018-04-24
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